Issued Patents All Time
Showing 376–400 of 563 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8192921 | Patterning process | Takao Yoshihara, Kazuhiro Katayama | 2012-06-05 |
| 8158330 | Resist protective coating composition and patterning process | Yuji Harada, Koji Hasegawa, Satoshi Shinachi | 2012-04-17 |
| 8129100 | Double patterning process | Katsuya Takemura, Kazumi Noda, Mutsuo Nakashima, Masaki Ohashi, Toshinobu Ishihara | 2012-03-06 |
| 8129086 | Polymerizable compound, polymer, positive resist composition, and patterning process using the same | Takeru Watanabe, Seiichiro Tachibana | 2012-03-06 |
| 8129099 | Double patterning process | Katsuya Takemura, Tsunehiro Nishi, Kazuhiro Katayama, Toshinobu Ishihara | 2012-03-06 |
| 8105748 | Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process | Masaki Ohashi, Youichi Ohsawa, Takeshi Kinsho, Seiichiro Tachibana | 2012-01-31 |
| 8105760 | Patterning process and pattern surface coating composition | Takeru Watanabe, Katsuhiro Kobayashi, Kazuhiro Katayama | 2012-01-31 |
| 8105764 | Patterning process | Takao Yoshihara, Toshinobu Ishihara | 2012-01-31 |
| 8101341 | Patterning process | Kazuhiro Katayama | 2012-01-24 |
| 8101335 | Resist composition and patterning process | Yuji Harada, Kazunori Maeda, Koji Hasegawa, Satoshi Shinachi | 2012-01-24 |
| 8088537 | Resist top coat composition and patterning process | Yuji Harada | 2012-01-03 |
| 8088554 | Bottom resist layer composition and patterning process using the same | — | 2012-01-03 |
| 8062828 | Positive resist composition and patterning process | Youichi Ohsawa, Takeshi Kinsho, Masaki Ohashi, Seiichiro Tachibana, Takeru Watanabe | 2011-11-22 |
| 8057982 | Monomer, resist composition, and patterning process | Takeshi Kinsho, Masaki Ohashi, Kazuhiro Katayama | 2011-11-15 |
| 8057981 | Resist composition, resist protective coating composition, and patterning process | Yuji Harada, Kazunori Maeda, Tomohiro Kobayashi | 2011-11-15 |
| 8057985 | Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process | Masaki Ohashi, Takeshi Kinsho, Youichi Ohsawa, Seiichiro Tachibana | 2011-11-15 |
| 8048610 | Sulfonium salt-containing polymer, resist composition, and patterning process | Youichi Ohsawa, Seiichiro Tachibana, Takeshi Kinsho | 2011-11-01 |
| 8043788 | Resist composition and patterning process | Tomohiro Kobayashi, Yuji Harada | 2011-10-25 |
| 8039198 | Sulfonium salt-containing polymer, resist composition, and patterning process | Seiichiro Tachibana, Youichi Ohsawa, Masaki Ohashi | 2011-10-18 |
| 8003295 | Patterning process and resist composition used therein | — | 2011-08-23 |
| 7923195 | Positive resist composition and patterning process using the same | Takanobu Takeda | 2011-04-12 |
| 7887991 | Positive resist composition and patterning process using the same | Takanobu Takeda | 2011-02-15 |
| 7879530 | Antireflective coating composition, antireflective coating, and patterning process | Seiichiro Tachibana, Kazumi Noda, Takeshi Kinsho | 2011-02-01 |
| 7871761 | Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern | Toshihiko Fujii, Youichi Ohsawa | 2011-01-18 |
| RE41580 | Lactone-containing compounds, polymers, resist compositions, and patterning method | Koji Hasegawa, Tsunehiro Nishi, Takeshi Kinsho, Osamu Watanabe | 2010-08-24 |