Issued Patents All Time
Showing 426–450 of 563 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7476486 | Resist composition and patterning process | Takanobu Takeda | 2009-01-13 |
| 7476485 | Resist lower layer film material and method for forming a pattern | Hideto Kato | 2009-01-13 |
| 7468236 | Amine compound, chemically amplified resist composition and patterning process | Takeru Watanabe | 2008-12-23 |
| 7459261 | Resist composition and patterning process using the same | Youichi Ohsawa, Seiichiro Tachibana | 2008-12-02 |
| 7455952 | Patterning process and resist overcoat material | Yuji Harada | 2008-11-25 |
| 7449277 | Positive resist compositions and patterning process | Takeshi Nagata, Takanobu Takeda | 2008-11-11 |
| 7427464 | Patterning process and undercoat-forming material | — | 2008-09-23 |
| 7416833 | Photoresist undercoat-forming material and patterning process | Takanobu Takeda | 2008-08-26 |
| 7378218 | Polymer, resist composition and patterning process | Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Kazuhiko Maeda +2 more | 2008-05-27 |
| 7378548 | Tertiary amine compounds having an ester structure and processes for preparing the same | Takeru Watanabe, Koji Hasegawa, Takeshi Kinsho | 2008-05-27 |
| 7368218 | Positive resist compositions and patterning process | Tatsushi Kaneko | 2008-05-06 |
| 7358025 | Photoresist undercoat-forming material and patterning process | — | 2008-04-15 |
| 7354693 | Polymer, resist protective coating material, and patterning process | Yoshio Kawai, Kazuhiko Maeda, Haruhiko Komoriya, Michitaka Ootani | 2008-04-08 |
| 7332616 | Polymerizable compound, polymer, positive-resist composition, and patterning process using the same | Yuji Harada, Yoshio Kawai | 2008-02-19 |
| 7303852 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | Tomohiro Kobayashi, Youichi Ohsawa | 2007-12-04 |
| 7303855 | Photoresist undercoat-forming material and patterning process | Satoshi Watanabe | 2007-12-04 |
| 7276623 | Polymerizable ester compounds | Yuji Harada, Yoshio Kawai, Kazuhiko Maeda, Haruhiko Komoriya, Michitaka Ootani | 2007-10-02 |
| 7255973 | Positive resist compositions and patterning process | Tatsushi Kaneko | 2007-08-14 |
| 7241553 | Polymer, resist composition, and patterning process | Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more | 2007-07-10 |
| 7232641 | Polymerizable compound, polymer, positive-resist composition, and patterning process using the same | Yuji Harada, Yoshio Kawai | 2007-06-19 |
| 7232638 | Resist composition and patterning process | Hideshi Kurihara, Takanobu Takeda, Osamu Watanabe | 2007-06-19 |
| 7214743 | Resist lower layer film material and method for forming a pattern | Hideto Kato | 2007-05-08 |
| 7202318 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | Takeshi Kinsho, Takeru Watanabe, Seiichiro Tachibana | 2007-04-10 |
| 7191611 | Vehicular air conditioning system | Takehiko Kitagawa, Masaharu Onda | 2007-03-20 |
| 7189493 | Polymer, positive resist composition, and patterning process using the same | Yuji Harada, Yoshio Kawai | 2007-03-13 |