Issued Patents All Time
Showing 401–425 of 563 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7771913 | Resist composition and patterning process using the same | Tatsushi Kaneko, Yuji Harada | 2010-08-10 |
| 7771914 | Resist composition and patterning process | Takao Yoshihara, Yuji Harada, Wataru Kusaki | 2010-08-10 |
| 7759047 | Resist protective film composition and patterning process | Yuji Harada, Takeru Watanabe | 2010-07-20 |
| 7745104 | Bottom resist layer composition and patterning process using the same | Toshihiko Fujii, Takanobu Takeda | 2010-06-29 |
| 7741015 | Patterning process and resist composition | Takao Yoshihara, Takeshi Kinsho, Koji Hasegawa, Yoshio Kawai, Katsuya Takemura | 2010-06-22 |
| 7687228 | Antireflection film composition and patterning process using the same | Kazumi Noda, Seiichiro Tachibana, Takeshi Kinsho, Tsutomu Ogihara | 2010-03-30 |
| 7678530 | Lactone-containing compound, polymer, resist composition, and patterning process | Koji Hasegawa, Satoshi Watanabe, Takeshi Kinsho, Seiichiro Tachibana | 2010-03-16 |
| 7670750 | Polymer, resist protective coating material, and patterning process | Yuji Harada, Koji Hasegawa | 2010-03-02 |
| 7666572 | Resist top coat composition and patterning process | Yuji Harada | 2010-02-23 |
| 7666967 | Ester compound, polymer, resist composition, and patterning process | Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Kazuhiko Maeda +2 more | 2010-02-23 |
| 7655378 | Negative resist composition and patterning process using the same | Takanobu Takeda | 2010-02-02 |
| 7642034 | Polymer, resist protective coating material, and patterning process | Koji Hasegawa, Yuji Harada | 2010-01-05 |
| 7632624 | Photoresist undercoat-forming material and patterning process | Toshihiko Fujii, Takeru Watanabe, Katshiro Kobayashi | 2009-12-15 |
| 7629106 | Resist composition and patterning process using the same | Koji Hasegawa, Youichi Ohsawa, Seiichiro Tachibana | 2009-12-08 |
| 7622242 | Resist composition and patterning process | Koji Hasegawa, Takeru Watanabe, Yuji Harada | 2009-11-24 |
| 7598016 | Resist composition and patterning process | Tomohiro Kobayashi, Yuji Harada | 2009-10-06 |
| 7592407 | Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process | Yuji Harada, Takeru Watanabe, Takeshi Kinsho | 2009-09-22 |
| 7569326 | Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process | Youichi Ohsawa, Masaki Ohashi, Seiichiro Tachibana, Takeru Watanabe | 2009-08-04 |
| 7569323 | Resist protective coating material and patterning process | Yuji Harada, Yoshio Kawai, Masayuki Endo, Masaru Sasago, Haruhiko Komoriya +3 more | 2009-08-04 |
| 7537880 | Polymer, resist composition, and patterning process | Yuji Harada, Takao Yoshihara, Wataru Kusaki, Tomohiro Kobayashi, Koji Hasegawa | 2009-05-26 |
| 7514204 | Resist composition and patterning process | Wataru Kusaki, Yuji Harada, Takao Yoshihara | 2009-04-07 |
| 7514202 | Thermal acid generator, resist undercoat material and patterning process | Youichi Ohsawa, Takeru Watanabe | 2009-04-07 |
| 7510820 | Resist undercoat-forming material and patterning process | Toshihiko Fujii | 2009-03-31 |
| 7491483 | Polymers, positive resist compositions and patterning process | Takeshi Kinsho, Takanobu Takeda | 2009-02-17 |
| 7488567 | Polymer, resist composition and patterning process | Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Kazuhiko Maeda +2 more | 2009-02-10 |