Issued Patents All Time
Showing 101–125 of 135 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6729339 | Method and apparatus for cooling a resonator of a megasonic transducer | John deLarios, Carl Woods | 2004-05-04 |
| 6705930 | System and method for polishing and planarizing semiconductor wafers using reduced surface area polishing pads and variable partial pad-wafer overlapping techniques | Yehiel Gotkis, Rod Kistler | 2004-03-16 |
| 6702202 | Method and apparatus for fluid delivery to a backside of a substrate | Carl Woods | 2004-03-09 |
| 6679763 | Apparatus and method for qualifying a chemical mechanical planarization process | Katrina Mikhaylich, Mike Ravkin | 2004-01-20 |
| 6656024 | Method and apparatus for reducing compressed dry air usage during chemical mechanical planarization | David Wei, Yehiel Gotkis | 2003-12-02 |
| 6626743 | Method and apparatus for conditioning a polishing pad | — | 2003-09-30 |
| 6616801 | Method and apparatus for fixed-abrasive substrate manufacturing and wafer polishing in a single process path | — | 2003-09-09 |
| 6612902 | Method and apparatus for end point triggering with integrated steering | Herbert E. Litvak | 2003-09-02 |
| 6612904 | Field controlled polishing apparatus | Robert G. Boehm, Jr. | 2003-09-02 |
| 6609961 | Chemical mechanical planarization belt assembly and method of assembly | Michael S. Lacy | 2003-08-26 |
| 6607425 | Pressurized membrane platen design for improving performance in CMP applications | Rod Kistler, Alek Owczarz | 2003-08-19 |
| 6599765 | Apparatus and method for providing a signal port in a polishing pad for optical endpoint detection | Michael S. Lacy | 2003-07-29 |
| 6592437 | Active gimbal ring with internal gel and methods for making same | Allan Paterson | 2003-07-15 |
| 6585572 | Subaperture chemical mechanical polishing system | Miguel Saldana, Yehiel Gotkis, Aleksander Owczarz | 2003-07-01 |
| 6579407 | Method and apparatus for aligning and setting the axis of rotation of spindles of a multi-body system | Aleksander Owczarz, Miguel Saldana | 2003-06-17 |
| 6547651 | Subaperture chemical mechanical planarization with polishing pad conditioning | Michael S. Lacy, David G. Halley | 2003-04-15 |
| 6495464 | Method and apparatus for fixed abrasive substrate preparation and use in a cluster CMP tool | Michael S. Lacy | 2002-12-17 |
| 6488568 | Optical view port for chemical mechanical planarization endpoint detection | Randolph Treur, Stephan Wolf | 2002-12-03 |
| 6475332 | Interlocking chemical mechanical polishing system | Katgenahalli Y. Ramanujam, Sridharan Srivatsan, Xuyen Pham | 2002-11-05 |
| 6471566 | Sacrificial retaining ring CMP system and methods for implementing the same | Katrina Mikhaylich | 2002-10-29 |
| 6435952 | Apparatus and method for qualifying a chemical mechanical planarization process | Katrina Mikhaylich, Mike Ravkin | 2002-08-20 |
| 6358118 | Field controlled polishing apparatus and method | Robert G. Boehm, Jr. | 2002-03-19 |
| 6146242 | Optical view port for chemical mechanical planarization endpoint detection | Randolph Treur, Stephan Wolf | 2000-11-14 |
| 5773871 | Integrated circuit structure and method of fabrication thereof | Joseph P. Ellul, Sing-Pin Tay | 1998-06-30 |
| 5726084 | Method for forming integrated circuit structure | Joseph P. Ellul, Sing-Pin Tay | 1998-03-10 |