David G. Halley has been granted 33 US patents while listed as an inventor at Strasbaugh . The first was granted in 1989 and the most recent in August 2006. David G. Halley ranks #105,480 of 4,157,543 US inventors in our database (top 2.5%). Patent records list David G. Halley in Renton, WA, US.
Patents per Year Patents granted per year, 1989 to 2006 Bar chart with a peak of 10 patents in 2003. peak 10 1989: 1 patents 1989 1990: 2 patents 1990 1994: 1 patents 1994 1995: 1 patents 1995 2001: 1 patents 2001 2002: 6 patents 2002 2003: 10 patents 2003 2004: 3 patents 2004 2005: 6 patents 2005 2006: 2 patents 2006
Issued Patents All Time
Profile Widget
Showing 1–25 of 33 patents
Patent # Title Co-Inventors Date Approx Value ⓘ
7083497 Polishing pad with built-in optical sensor Gregory Barbour , Ben Smedley , Stephen H. Wolf 2006-08-01
6986701 Polishing pad with built-in optical sensor Gregory Barbour , Ben Smedley , Stephen H. Wolf 2006-01-17
6976901 In situ feature height measurement Greg Barbour 2005-12-20
6945856 Subaperture chemical mechanical planarization with polishing pad conditioning John M. Boyd , Michael S. Lacy 2005-09-20
6921719 Method of preparing whole semiconductor wafer for analysis Allan Paterson 2005-07-26
6887133 Pad support method for chemical mechanical planarization — 2005-05-03
$240,000
6885206 Device for supporting thin semiconductor wafers — 2005-04-26
$122,000
6855030 Modular method for chemical mechanical planarization — 2005-02-15
$235,000
6808443 Projected gimbal point drive — 2004-10-26
$9,361,000
6739945 Polishing pad with built-in optical sensor Gregory Barbour , Ben Smedley , Stephen H. Wolf 2004-05-25
$365,000
6692339 Combined chemical mechanical planarization and cleaning — 2004-02-17
$777,000
6629874 Feature height measurement during CMP — 2003-10-07
$975,000
6602121 Pad support apparatus for chemical mechanical planarization — 2003-08-05
$1,022,000
6551179 Hard polishing pad for chemical mechanical planarization — 2003-04-22
$1,327,000
6547651 Subaperture chemical mechanical planarization with polishing pad conditioning John M. Boyd , Michael S. Lacy 2003-04-15
$1,302,000
6527621 Pad retrieval apparatus for chemical mechanical planarization — 2003-03-04
$1,293,000
6520843 High planarity chemical mechanical planarization — 2003-02-18
$1,205,000
6517419 Shaping polishing pad for small head chemical mechanical planarization — 2003-02-11
$1,248,000
6514129 Multi-action chemical mechanical planarization device and method — 2003-02-04
$632,000
6514121 Polishing chemical delivery for small head chemical mechanical planarization — 2003-02-04
$632,000
6511368 Spherical drive assembly for chemical mechanical planarization — 2003-01-28
$1,233,000
6495463 Method for chemical mechanical polishing — 2002-12-17
$1,270,000
6464574 Pad quick release device for chemical mechanical planarization — 2002-10-15
$1,184,000
6450860 Pad transfer apparatus for chemical mechanical planarization — 2002-09-17
$1,198,000
6379235 Wafer support for chemical mechanical planarization — 2002-04-30
