MK

Michael Kwan

Applied Materials: 9 patents #1,414 of 7,310Top 20%
NI Nova Measuring Instruments: 4 patents #29 of 108Top 30%
MIT: 1 patents #4,386 of 9,367Top 50%
Overall (All Time): #342,228 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11733035 Feed-forward of multi-layer and multi-process information using XPS and XRF technologies Heath A. Pois, Wei Ti Lee, Lawrence V. Bot, Mark Klare, Charles Thomas Larson 2023-08-22
11029148 Feed-forward of multi-layer and multi-process information using XPS and XRF technologies Heath A. Pois, Wei Ti Lee, Lawrence V. Bot, Mark Klare, Charles Thomas Larson 2021-06-08
10648802 Feed-forward of multi-layer and multi-process information using XPS and XRF technologies Heath A. Pois, Wei Ti Lee, Lawrence V. Bot, Mark Klare, Charles Thomas Larson 2020-05-12
10082390 Feed-forward of multi-layer and multi-process information using XPS and XRF technologies Heath A. Pois, Wei Ti Lee, Lawrence V. Bot, Mark Klare, Charles Thomas Larson 2018-09-25
7638440 Method of depositing an amorphous carbon film for etch hardmask application Yuxiang Wang, Sudha Rathi, Hichem M'Saad 2009-12-29
7407893 Liquid precursors for the CVD deposition of amorphous carbon films Martin Jay Seamons, Wendy H. Yeh, Sudha Rathi, Deenesh Padhi, Andy Luan +6 more 2008-08-05
7253123 Method for producing gate stack sidewall spacers Reza Arghavani, Li-Qun Xia, Kang Sub Yim 2007-08-07
7064077 Method for high aspect ratio HDP CVD gapfill Zhong Qiang Hua, Dong Li, Zhengquan Tan, Zhuang Li, Bruno Geoffrion +1 more 2006-06-20
7052552 Gas chemistry cycling to achieve high aspect ratio gapfill with HDP-CVD Eric Liu 2006-05-30
6812153 Method for high aspect ratio HDP CVD gapfill Zhong Qiang Hua, Dong Li, Zhengquan Tan, Zhuang Li, Bruno Geoffrion +1 more 2004-11-02
6715496 Method and apparatus for cleaning a semiconductor wafer processing system Alan W. Collins, Jalel Hamila, Padmanabhan Krishnaraj, Zhengquan Tan 2004-04-06
6596123 Method and apparatus for cleaning a semiconductor wafer processing system Alan W. Collins, Jalel Hamila, Padmanabhan Krishnaraj, Zhengquan Tan 2003-07-22
6335288 Gas chemistry cycling to achieve high aspect ratio gapfill with HDP-CVD Eric Liu 2002-01-01
6045877 Pyrolytic chemical vapor deposition of silicone films Karen K. Gleason 2000-04-04