Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12356705 | Electrical contact cavity structure and methods of forming the same | Nicolas L. Breil, Lisa McGill, Bocheng Cao, Pei Liu, Avgerinos V. Gelatos | 2025-07-08 |
| 11087979 | Cleaning method | Christopher S. Olsen, Peter Stone, Teng-Fang Kuo, Ping Han Hsieh | 2021-08-10 |
| 10199221 | Cleaning method | Christopher S. Olsen, Peter Stone, Teng-Fang Kuo, Ping Han Hsieh | 2019-02-05 |
| 9870921 | Cleaning method | Christopher S. Olsen, Peter Stone, Teng-Fang Kuo, Ping Han Hsieh | 2018-01-16 |
| 8927400 | Safe handling of low energy, high dose arsenic, phosphorus, and boron implanted wafers | Majeed A. Foad, Kartik Santhanam | 2015-01-06 |
| 8642128 | Enhanced scavenging of residual fluorine radicals using silicon coating on process chamber walls | Dongwon Choi, Dong-Hyung LEE, Tze Wing Poon, Peter I. Porshnev, Majeed A. Foad | 2014-02-04 |
| 8501605 | Methods and apparatus for conformal doping | Kartik Santhanam, Martin A. Hilkene, Mark R. Lee, Matthew D. Scotney-Castle, Peter I. Porshnev | 2013-08-06 |
| 8492177 | Methods for quantitative measurement of a plasma immersion process | Daping Yao, Peter I. Porshnev, Martin A. Hilkene, Matthew D. Scotney-Castle | 2013-07-23 |
| 8003500 | Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking | Kartik Santhanam, Yen B. Ta, Martin A. Hilkene, Matthew D. Scotney-Castle, Canfeng Lai +2 more | 2011-08-23 |
| 7867921 | Reduction of etch-rate drift in HDP processes | Anchuan Wang, Young S. Lee, Jason Bloking, Jin-Ho Jeon, Hemant P. Mungekar | 2011-01-11 |
| 7745350 | Impurity control in HDP-CVD DEP/ETCH/DEP processes | Anchuan Wang, Young S. Lee, Jason Bloking, Jin-Ho Jeon, Hemant P. Mungekar | 2010-06-29 |
| 7659184 | Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking | Kartik Santhanam, Yen B. Ta, Martin A. Hilkene, Matthew D. Scotney-Castle, Canfeng Lai +2 more | 2010-02-09 |
| 7628897 | Reactive ion etching for semiconductor device feature topography modification | Hemant P. Mungekar, Anjana M. Patel, Anchuan Wang, Bikram Kapoor | 2009-12-08 |
| 7329586 | Gapfill using deposition-etch sequence | Hemant P. Mungekar, Young S. Lee, Yasutoshi Okuno, Hiroshi Yuasa | 2008-02-12 |
| 7229931 | Oxygen plasma treatment for enhanced HDP-CVD gapfill | Hemant P. Mungekar, Young S. Lee, Karen Greig, Bikram Kapoor | 2007-06-12 |
| 7205240 | HDP-CVD multistep gapfill process | M. Ziaul Karim, Bikram Kapoor, Anchuan Wang, Dong Li, Katsunari Ozeki +1 more | 2007-04-17 |
| 6803325 | Apparatus for improving barrier layer adhesion to HDP-FSG thin films | Hichem M'Saad, Dana Tribula, Farhad Moghadam, Sameer Desai | 2004-10-12 |
| 6413871 | Nitrogen treatment of polished halogen-doped silicon glass | Hichem M'Saad, Derek R. Witty, Lin Zhang, Yaxin Wang | 2002-07-02 |
| 6410457 | Method for improving barrier layer adhesion to HDP-FSG thin films | Hichem M'Saad, Dana Tribula, Farhad Moghadam, Sameer Desai | 2002-06-25 |