HP

Hieu Pham

IN Intermolecular: 11 patents #54 of 248Top 25%
S3 Sandisk 3D: 11 patents #41 of 180Top 25%
KT Kabushiki Kaisha Toshiba: 11 patents #2,779 of 21,451Top 15%
AM AMD: 9 patents #1,329 of 9,279Top 15%
SL Spansion Llc.: 6 patents #149 of 769Top 20%
Globalfoundries: 1 patents #2,221 of 4,424Top 55%
Cypress Semiconductor: 1 patents #1,072 of 1,852Top 60%
VU Versum Materials Us: 1 patents #84 of 174Top 50%
Overall (All Time): #148,771 of 4,157,543Top 4%
26
Patents All Time

Issued Patents All Time

Showing 25 most recent of 26 patents

Patent #TitleCo-InventorsDate
12205061 Shared data induced quality control for a chemical mechanical planarization process Cesar Clavero, Vid Gopal, Ryan W. Clarke, Esmeralda Yitamben, Anupama Mallikarjunan +6 more 2025-01-21
9246096 Atomic layer deposition of metal oxides for memory applications Zhendong Hong, Vidyut Gopal, Imran Hashim, Randall J. Higuchi, Tim Minvielle +1 more 2016-01-26
9202758 Method for manufacturing a contact for a semiconductor component and related structure Paul R. Besser, Minh Van Ngo, Connie P. Wang, Jinsong Yin 2015-12-01
9087978 Transition metal oxide bilayers Vidyut Gopal, Imran Hashim, Tim Minvielle, Yun Wang, Takeshi Yamaguchi +1 more 2015-07-21
9006026 Atomic layer deposition of metal oxides for memory applications Zhendong Hong, Vidyut Gopal, Imran Hashim, Randall J. Higuchi, Tim Minvielle +1 more 2015-04-14
8987697 Transition metal oxide bilayers Vidyut Gopal, Imran Hashim, Tim Minvielle, Yun Wang, Takeshi Yamaguchi +1 more 2015-03-24
8906736 Multifunctional electrode Vidyut Gopal, Imran Hashim, Tim Minvielle, Dipankar Pramanik, Yun Wang +2 more 2014-12-09
8859328 Multifunctional electrode Vidyut Gopal, Imran Hashim, Tim Minvielle, Dipankar Pramanik, Yun Wang +2 more 2014-10-14
8846443 Atomic layer deposition of metal oxides for memory applications Zhendong Hong, Randall J. Higuchi, Vidyut Gopal, Imran Hashim, Tim Minvielle +1 more 2014-09-30
8779407 Multifunctional electrode Vidyut Gopal, Imran Hashim, Dipankar Pramanik, Yun Wang, Hong Sheng Yang 2014-07-15
8735217 Multifunctional electrode Vidyut Gopal, Imran Hashim, Tim Minvielle, Dipankar Pramanik, Yun Wang +2 more 2014-05-27
8704203 Transition metal oxide bilayers Vidyut Gopal, Imran Hashim, Tim Minvielle, Yun Wang, Takeshi Yamaguchi +1 more 2014-04-22
8569104 Transition metal oxide bilayers Vidyut Gopal, Imran Hashim, Tim Minvielle, Yun Wang, Takeshi Yamaguchi +1 more 2013-10-29
8415256 Gap-filling with uniform properties Alexander H. Nickel, Lu You, Hirokazu Tokuno, Minh Quoc Tran, Minh Van Ngo +2 more 2013-04-09
8309455 SiH4 soak for low hydrogen SiN deposition to improve flash memory device performance Sung Jin Kim, Alexander H. Nickel, Minh Van Ngo, Masato Tsuboi, Shinich Imada 2012-11-13
8202810 Low-H plasma treatment with N2 anneal for electronic memory devices Alexander H. Nickel, Allen L. Evans, Minh Quoc Tran, Lu You, Minh Van Ngo +4 more 2012-06-19
8026169 Cu annealing for improved data retention in flash memory devices Lu You, Alexander H. Nickel, Minh Quoc Tran, Minh Van Ngo, Erik Wilson +4 more 2011-09-27
7985674 SiH4 soak for low hydrogen SiN deposition to improve flash memory device performance Sung Jin Kim, Alexander H. Nickel, Minh Van Ngo, Masato Tsuboi, Shinich Imada 2011-07-26
7884030 Gap-filling with uniform properties Alexander H. Nickel, Lu You, Hirokazu Tokuno, Minh Quoc Tran, Minh Van Ngo +2 more 2011-02-08
7534732 Semiconductor devices with copper interconnects and composite silicon nitride capping layers Minh Van Ngo, Erik Wilson, Robert A. Huertas, Lu You, Hirokazu Tokuno +2 more 2009-05-19
7307027 Void free interlayer dielectric Minh Van Ngo, Alexander H. Nickel, Jean Y. Yang, Hirokazu Tokuno, Weidong Qian 2007-12-11
7217660 Method for manufacturing a semiconductor component that inhibits formation of wormholes Connie P. Wang, Paul R. Besser, Jinsong Yin, Minh Van Ngo 2007-05-15
6875694 Method of treating inlaid copper for improved capping layer adhesion without damaging porous low-k materials Minh Van Ngo, Robert A. Huertas 2005-04-05
6809043 Multi-stage, low deposition rate PECVD oxide Minh Van Ngo, Robert A. Huertas 2004-10-26
6746971 Method of forming copper sulfide for memory cell Minh Van Ngo, Sergey Lopatin, Suzette K. Pangrle, Nicholas H. Tripsas 2004-06-08