| 9202758 |
Method for manufacturing a contact for a semiconductor component and related structure |
Paul R. Besser, Minh Van Ngo, Connie P. Wang, Hieu Pham |
2015-12-01 |
| 8039391 |
Method of forming a contact in a semiconductor device with engineered plasma treatment profile of barrier metal layer |
Wen Yu, Connie P. Wang, Paul R. Besser, Keizaburo Yoshie |
2011-10-18 |
| 7476604 |
Aggressive cleaning process for semiconductor device contact formation |
Ning Cheng, Minh Van Ngo, Paul R. Besser, Connie P. Wang, Russell Rosaire Austin Callahan +4 more |
2009-01-13 |
| 7407882 |
Semiconductor component having a contact structure and method of manufacture |
Connie P. Wang, Paul R. Besser, Wen Yu, Keizaburo Yoshie |
2008-08-05 |
| 7335594 |
Method for manufacturing a memory device having a nanocrystal charge storage region |
Connie P. Wang, Zoran Krivokapic, Suzette K. Pangrle |
2008-02-26 |
| 7217660 |
Method for manufacturing a semiconductor component that inhibits formation of wormholes |
Connie P. Wang, Paul R. Besser, Hieu Pham, Minh Van Ngo |
2007-05-15 |
| 7071086 |
Method of forming a metal gate structure with tuning of work function by silicon incorporation |
Christy Mei-Chu Woo, Paul R. Besser, Minh Van Ngo, James Pan |
2006-07-04 |
| 7060571 |
Semiconductor device with metal gate and high-k tantalum oxide or tantalum oxynitride gate dielectric |
Minh Van Ngo, Christy Mei-Chu Woo, James Pan, Paul R. Besser |
2006-06-13 |
| 7033888 |
Engineered metal gate electrode |
James Pan, Paul R. Besser, Christy Mei-Chu Woo, Minh Van Ngo |
2006-04-25 |
| 6927162 |
Method of forming a contact in a semiconductor device with formation of silicide prior to plasma treatment |
Wen Yu, Connie P. Wang, Paul R. Besser, Keizaburo Yoshie |
2005-08-09 |
| 6893910 |
One step deposition method for high-k dielectric and metal gate electrode |
Christy Mei-Chu Woo, Paul R. Besser, Minh Van Ngo, James Pan |
2005-05-17 |
| 6861350 |
Method of manufacturing semiconductor device comprising silicon-rich tasin metal gate electrode |
Minh Van Ngo, Christy Mei-Chu Woo, James Pan, Paul R. Besser |
2005-03-01 |
| 6830998 |
Gate dielectric quality for replacement metal gate transistors |
James Pan, Paul R. Besser, Christy Mei-Chu Woo, Minh Van Ngo |
2004-12-14 |
| 6727560 |
Engineered metal gate electrode |
James Pan, Paul R. Besser, Christy Mei-Chu Woo, Minh Van Ngo |
2004-04-27 |
