Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9202758 | Method for manufacturing a contact for a semiconductor component and related structure | Paul R. Besser, Minh Van Ngo, Connie P. Wang, Hieu Pham | 2015-12-01 |
| 8039391 | Method of forming a contact in a semiconductor device with engineered plasma treatment profile of barrier metal layer | Wen Yu, Connie P. Wang, Paul R. Besser, Keizaburo Yoshie | 2011-10-18 |
| 7476604 | Aggressive cleaning process for semiconductor device contact formation | Ning Cheng, Minh Van Ngo, Paul R. Besser, Connie P. Wang, Russell Rosaire Austin Callahan +4 more | 2009-01-13 |
| 7407882 | Semiconductor component having a contact structure and method of manufacture | Connie P. Wang, Paul R. Besser, Wen Yu, Keizaburo Yoshie | 2008-08-05 |
| 7335594 | Method for manufacturing a memory device having a nanocrystal charge storage region | Connie P. Wang, Zoran Krivokapic, Suzette K. Pangrle | 2008-02-26 |
| 7217660 | Method for manufacturing a semiconductor component that inhibits formation of wormholes | Connie P. Wang, Paul R. Besser, Hieu Pham, Minh Van Ngo | 2007-05-15 |
| 7071086 | Method of forming a metal gate structure with tuning of work function by silicon incorporation | Christy Mei-Chu Woo, Paul R. Besser, Minh Van Ngo, James Pan | 2006-07-04 |
| 7060571 | Semiconductor device with metal gate and high-k tantalum oxide or tantalum oxynitride gate dielectric | Minh Van Ngo, Christy Mei-Chu Woo, James Pan, Paul R. Besser | 2006-06-13 |
| 7033888 | Engineered metal gate electrode | James Pan, Paul R. Besser, Christy Mei-Chu Woo, Minh Van Ngo | 2006-04-25 |
| 6927162 | Method of forming a contact in a semiconductor device with formation of silicide prior to plasma treatment | Wen Yu, Connie P. Wang, Paul R. Besser, Keizaburo Yoshie | 2005-08-09 |
| 6893910 | One step deposition method for high-k dielectric and metal gate electrode | Christy Mei-Chu Woo, Paul R. Besser, Minh Van Ngo, James Pan | 2005-05-17 |
| 6861350 | Method of manufacturing semiconductor device comprising silicon-rich tasin metal gate electrode | Minh Van Ngo, Christy Mei-Chu Woo, James Pan, Paul R. Besser | 2005-03-01 |
| 6830998 | Gate dielectric quality for replacement metal gate transistors | James Pan, Paul R. Besser, Christy Mei-Chu Woo, Minh Van Ngo | 2004-12-14 |
| 6727560 | Engineered metal gate electrode | James Pan, Paul R. Besser, Christy Mei-Chu Woo, Minh Van Ngo | 2004-04-27 |