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Multi-step deposition of a spacer material for reducing void formation in a dielectric material of a contact level of a semiconductor device |
Markus Lenski, Kerstin Ruttloff, Volker Jaschke, Ralf Otterbach |
2015-03-24 |
| 8932930 |
Enhancing integrity of a high-K gate stack by protecting a liner at the gate bottom during gate head exposure |
Sven Beyer, Gunter Grasshoff |
2015-01-13 |
| 8765542 |
Methods of forming a semiconductor device while preventing or reducing loss of active area and/or isolation regions |
Joachim Patzer, Markus Lenski, Stephan Kronholz |
2014-07-01 |
| 8765559 |
Sophisticated gate electrode structures formed by cap layer removal with reduced loss of embedded strain-inducing semiconductor material |
Stephan Kronholz, Gunda Beernink, Markus Lenski, Frank Richter |
2014-07-01 |
| 8561446 |
Method and device for fabricating bonding wires on the basis of microelectronic manufacturing techniques |
Matthias Lehr, Frank Kuechenmeister |
2013-10-22 |
| 8560857 |
Information processing apparatus, a server apparatus, a method of an information processing apparatus, a method of a server apparatus, and an apparatus executable program |
Seiji Munetoh, Hiroshi Maruyama, Nataraj Nagaratnam |
2013-10-15 |
| 8338306 |
Forming semiconductor resistors in a semiconductor device comprising metal gates by increasing etch resistivity of the resistors |
Jens Heinrich, Ralf Richter, Katja Steffen, Johannes Groschopf, Andreas Ott +2 more |
2012-12-25 |
| 8338284 |
Stress engineering in a contact level of semiconductor devices by stressed conductive layers and an isolation spacer |
Kai Frohberg, Hartmut Ruelke, Volker Jaschke, Joerg Hohage |
2012-12-25 |
| 8329549 |
Enhancing integrity of a high-k gate stack by protecting a liner at the gate bottom during gate head exposure |
Sven Beyer, Gunter Grasshoff |
2012-12-11 |
| 8329526 |
Cap removal in a high-k metal gate electrode structure by using a sacrificial fill material |
Jens Heinrich, Ralf Richter, Markus Lenski |
2012-12-11 |
| 8258062 |
Cap layer removal in a high-K metal gate stack by using an etch process |
Ralf Richter, Martin Mazur |
2012-09-04 |
| 8171295 |
Information processing apparatus, a server apparatus, a method of an information processing apparatus, a method of a server apparatus, and an apparatus executable process |
Seiji Munetoh, Hiroshi Maruyama, Nataraj Nagaratnam |
2012-05-01 |
| 7981740 |
Enhanced cap layer integrity in a high-K metal gate stack by using a hard mask for offset spacer patterning |
Markus Lenski, Kerstin Ruttloff, Martin Mazur, Ralf Otterbach |
2011-07-19 |
| 7951677 |
Corner rounding in a replacement gate approach based on a sacrificial fill material applied prior to work function metal deposition |
Jens Heinrich, Thomas Werner, Frank Richter |
2011-05-31 |
| 7757950 |
Election system enabling coercion-free remote voting |
Bernard Van Acker |
2010-07-20 |
| 7564977 |
System, method and program product for anonymous transfer of messages |
Anna Marino, Bernard Van Acker |
2009-07-21 |
| 7490768 |
Election system enabling coercion-free remote voting |
Bernard Van Acker |
2009-02-17 |
| 7375032 |
Semiconductor substrate thinning method for manufacturing thinned die |
Matthias Lehr, Marcel Wieland, Lothar Mergili, Frank Kuechenmeister |
2008-05-20 |
| 6892301 |
Method and system for securely handling information between two information processing devices |
Uwe Hansmann |
2005-05-10 |
