| 9646838 |
Method of forming a semiconductor structure including silicided and non-silicided circuit elements |
Dominic Thurmer, Sven Metzger, Markus Lenski |
2017-05-09 |
| 9177871 |
Balancing asymmetric spacers |
Peter Baars, Bastian Haussdoerfer |
2015-11-03 |
| 9177874 |
Method of forming a semiconductor device employing an optical planarization layer |
Ardechir Pakfar, Dominic Thurmer, Chih-Chun Wang, Remi Riviere, Robert Melzer +2 more |
2015-11-03 |
| 9111756 |
Integrated circuits with protected resistors and methods for fabricating the same |
Hans-Peter Moll |
2015-08-18 |
| 9064961 |
Integrated circuits including epitaxially grown strain-inducing fills doped with boron for improved robustness from delimination and methods for fabricating the same |
Joanna Wasyluk, Carsten Reichel, Kai Wurster |
2015-06-23 |
| 9034746 |
Gate silicidation |
Ardechir Pakfar, Clemens Fitz, Dominic Thurmer |
2015-05-19 |
| 9029919 |
Methods of forming silicon/germanium protection layer above source/drain regions of a transistor and a device having such a protection layer |
Stephan Kronholz |
2015-05-12 |
| 8969190 |
Methods of forming a layer of silicon on a layer of silicon/germanium |
Stephan Kronholz |
2015-03-03 |
| 8906794 |
Gate silicidation |
Ardechir Pakfar, Clemens Fitz, Dominic Thurmer |
2014-12-09 |
| 8889022 |
Methods of forming asymmetric spacers on various structures on integrated circuit products |
Hans-Peter Moll |
2014-11-18 |
| 8765542 |
Methods of forming a semiconductor device while preventing or reducing loss of active area and/or isolation regions |
Frank Seliger, Markus Lenski, Stephan Kronholz |
2014-07-01 |
| 7183188 |
Method for fabricating contact-making connections |
Matthias Kronke |
2007-02-27 |
