Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9064961 | Integrated circuits including epitaxially grown strain-inducing fills doped with boron for improved robustness from delimination and methods for fabricating the same | Joanna Wasyluk, Joachim Patzer, Kai Wurster | 2015-06-23 |
| 8674416 | Semiconductor device with reduced threshold variability having a threshold adjusting semiconductor alloy in the device active region | Thorsten Kammler, Annekathrin Zeun, Stephan Kronholz | 2014-03-18 |
| 8614122 | Formation of a channel semiconductor alloy by forming a hard mask layer stack and applying a plasma-based mask patterning process | Stephan Kronholz, Gunda Beernink | 2013-12-24 |
| 8609482 | Enhancing interface characteristics between a channel semiconductor alloy and a gate dielectric by an oxidation process | Stephan Kronholz, Annekathrin Zeun, Martin Trentzsch | 2013-12-17 |
| 8518784 | Adjusting of strain caused in a transistor channel by semiconductor material provided for threshold adjustment | Stephan Kronholz, Thorsten Kammler, Gunda Beernink | 2013-08-27 |
| 8324119 | Enhancing deposition uniformity of a channel semiconductor alloy by an in situ etch process | Thorsten Kammler, Annekathrin Zeun, Stephan Kronholz | 2012-12-04 |
| 8293596 | Formation of a channel semiconductor alloy by depositing a hard mask for the selective epitaxial growth | Stephan Kronholz, Annekathrin Zeun, Thorsten Kammler | 2012-10-23 |
| 8283225 | Enhancing selectivity during formation of a channel semiconductor alloy by a wet oxidation process | Stephan Kronholz, Falk Graetshe, Boris Bayha | 2012-10-09 |
| 8247282 | Enhancing interface characteristics between a channel semiconductor alloy and a gate dielectric by an oxidation process | Stephan Kronholz, Annekathrin Zeun, Martin Trentzsch | 2012-08-21 |