Issued Patents All Time
Showing 26–50 of 85 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7933016 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Boris Golovanevsky, Michael Friedmann, Ian Smith, Michael Adel +10 more | 2011-04-26 |
| 7879627 | Overlay marks and methods of manufacturing such marks | Mark Ghinovker, Michael Adel, Walter D. Mieher, Dan Wack | 2011-02-01 |
| 7876440 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel +1 more | 2011-01-25 |
| 7838309 | Measurement and control of strained devices | Daniel Wack, John Fielden | 2010-11-23 |
| 7826071 | Parametric profiling using optical spectroscopic systems | Andrei V. Shchegrov, Anatoly Fabrikant, Mehrdad Nikoonahad, Daniel Wack, Noah Bareket +2 more | 2010-11-02 |
| 7767956 | Methods and systems for lithography process control | Suresh Lakkapragada, Kyle Brown, Matt Hankinson | 2010-08-03 |
| 7751046 | Methods and systems for determining a critical dimension and overlay of a specimen | Kyle Brown, Rodney Smedt, Gary Bultman, Mehrdad Nikoonahad, Dan Wack +2 more | 2010-07-06 |
| 7733111 | Segmented optical and electrical testing for photovoltaic devices | Guoheng Zhao, Bin-Ming Benjamin Tsai, Mehdi Vaez-Iravani, George H. Zapalac, Jr., Samuel Ngai | 2010-06-08 |
| 7709794 | Defect detection using time delay lock-in thermography (LIT) and dark field LIT | Guoheng Zhao, Geordie Zapalac, Samuel Ngai, Mehdi Vaez-Iravani, Vineet Dharmadhikari | 2010-05-04 |
| 7678516 | Test structures and methods for monitoring or controlling a semiconductor fabrication process | Kevin P. Monahan, Brad Eichelberger | 2010-03-16 |
| 7663753 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Boris Golovanevsky, Michael Friedmann, Ian Smith, Michael Adel +10 more | 2010-02-16 |
| 7656512 | Method for determining lithographic focus and exposure | Walter D. Mieher, Thaddeus Gerard Dziura, Chris Mack | 2010-02-02 |
| 7564557 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel +1 more | 2009-07-21 |
| 7462814 | Methods and systems for lithography process control | Suresh Lakkapragada, Kyle Brown, Matt Hankinson | 2008-12-09 |
| 7460981 | Methods and systems for determining a presence of macro and micro defects on a specimen | Gary Bultman, Kyle Brown, Mehrdad Nikoonahad, Dan Wack, John Fielden | 2008-12-02 |
| 7433040 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel +3 more | 2008-10-07 |
| 7385699 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel +3 more | 2008-06-10 |
| 7382447 | Method for determining lithographic focus and exposure | Walter D. Mieher, Thaddeus Gerard Dziura, Chris Mack | 2008-06-03 |
| 7379183 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel +6 more | 2008-05-27 |
| 7349090 | Methods and systems for determining a property of a specimen prior to, during, or subsequent to lithography | Dan Wack, Kyle Brown, Gary Bultman, Mehrdad Nikoonahad, John Fielden | 2008-03-25 |
| 7317531 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel +10 more | 2008-01-08 |
| 7317824 | Overlay marks, methods of overlay mark design and methods of overlay measurements | Mark Ghinovker, Michael Adel, Walter D. Mieher, Dan Wack | 2008-01-08 |
| 7303842 | Systems and methods for modifying a reticle's optical properties | Sterling Watson, Chris Mack, Stanley Stokowski, Zain Saidin, Larry S. Zurbrick | 2007-12-04 |
| 7301634 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel +7 more | 2007-11-27 |
| 7300725 | Method for determining and correcting reticle variations | Sterling Watson, Chris Mack, Stanley Stokowski, Zain Saidin | 2007-11-27 |