Issued Patents All Time
Showing 176–200 of 286 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6995051 | Irradiation assisted reactive ion etching | Mark C. Hakey, Steven J. Holmes, David V. Horak | 2006-02-07 |
| 6989308 | Method of forming FinFET gates without long etches | Mark C. Hakey, Steven J. Holmes, David Vaclav Hofak, Charles W. Koburger, III, Peter H. Mitchell +1 more | 2006-01-24 |
| 6989323 | Method for forming narrow gate structures on sidewalls of a lithographically defined sacrificial material | Bruce B. Doris, Mark C. Hakey, Steven J. Holmes, David V. Horak, Charles W. Koburger, III | 2006-01-24 |
| 6970372 | Dual gated finfet gain cell | Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Mark E. Masters, Peter H. Mitchell | 2005-11-29 |
| 6960510 | Method of making sub-lithographic features | Sadanand V. Deshpande, David V. Horak, Wesley C. Natzle, Akihisa Sekiguchi, Len Yuan Tsou +1 more | 2005-11-01 |
| 6940134 | Semiconductor with contact contacting diffusion adjacent gate electrode | Mark C. Hakey, Steven J. Holmes, David V. Horak | 2005-09-06 |
| 6936879 | Increased capacitance trench capacitor | Mark C. Hakey, Steven J. Holmes, William H. Ma | 2005-08-30 |
| 6930060 | Method for forming a uniform distribution of nitrogen in silicon oxynitride gate dielectric | Anthony I. Chou, Michael P. Chudzik, Oleg Gluschenkov, Paul Kirsch, Kristen Scheer +1 more | 2005-08-16 |
| 6924200 | Methods using disposable and permanent films for diffusion and implantation doping | Mark C. Hakey, Steven J. Holmes, David V. Horak, William H. Ma, Patricia Marmillion +1 more | 2005-08-02 |
| 6919277 | Deliberate semiconductor film variation to compensate for radial processing differences, determine optimal device characteristics, or produce small productions | Mark C. Hakey, Steven J. Holmes, David V. Horak | 2005-07-19 |
| 6891226 | Dual gate logic device | Mark C. Hakey, Steven J. Holmes, David V. Horak, William H. Ma | 2005-05-10 |
| 6891235 | FET with T-shaped gate | Mark C. Hakey, Steven J. Holmes, David V. Horak, Edward J. Nowak | 2005-05-10 |
| 6875703 | Method for forming quadruple density sidewall image transfer (SIT) structures | Mark C. Hakey, Steven J. Holmes, David V. Horak, Charles W. Koburger, III, Peter H. Mitchell | 2005-04-05 |
| 6875685 | Method of forming gas dielectric with support structure | Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Peter H. Mitchell, Larry Nesbit +1 more | 2005-04-05 |
| 6867143 | Method for etching a semiconductor substrate using germanium hard mask | Mark C. Hakey, Steven J. Holmes, David V. Horak, William H. Ma | 2005-03-15 |
| 6821833 | Method for separately optimizing thin gate dielectric of PMOS and NMOS transistors within the same semiconductor chip and device manufactured thereby | Anthony I. Chou, Patrick R. Varekamp, Jeffrey W. Sleight, Akihisa Sekiguchi | 2004-11-23 |
| 6818952 | Damascene gate multi-mesa MOSFET | Jack A. Mandelman, Byeongju Park | 2004-11-16 |
| 6815737 | Method for selective trimming of gate structures and apparatus formed thereby | Mark C. Hakey, Steven J. Holmes, David V. Horak, Paul A. Rabidoux | 2004-11-09 |
| 6798017 | Vertical dual gate field effect transistor | Mark C. Hakey, Steven J. Holmes, David V. Horak, James M. Leas, William H. Ma +1 more | 2004-09-28 |
| 6797641 | Gate oxide stabilization by means of germanium components in gate conductor | Steven J. Holmes, Mark C. Hakey, David V. Horak | 2004-09-28 |
| 6780736 | Method for image reversal of implant resist using a single photolithography exposure and structures formed thereby | Steven J. Holmes, Arpan Mahorowala, Dirk Pfeiffer | 2004-08-24 |
| 6780720 | Method for fabricating a nitrided silicon-oxide gate dielectric | Jay Burnham, Anthony I. Chou, Margaret L. Gibson, James S. Nakos, Steven M. Shank | 2004-08-24 |
| 6767789 | Method for interconnection between transfer devices and storage capacitors in memory cells and device formed thereby | Gary B. Bronner, David V. Horak, Jack A. Mandelman | 2004-07-27 |
| 6759315 | Method for selective trimming of gate structures and apparatus formed thereby | Mark C. Hakey, Steven J. Holmes, David V. Horak, Paul A. Rabidoux | 2004-07-06 |
| 6716647 | Deliberate semiconductor film variation to compensate for radial processing differences, determine optimal device characteristics, or produce small productions runs | Mark C. Hakey, Steven J. Holmes, David Horak | 2004-04-06 |