TA

Takashi Ando

IBM: 466 patents #26 of 70,183Top 1%
Globalfoundries: 29 patents #87 of 4,424Top 2%
SO Sony: 23 patents #1,718 of 25,231Top 7%
Sumitomo Electric Industries: 13 patents #1,957 of 21,551Top 10%
TO Toyota: 13 patents #2,130 of 26,838Top 8%
HI Hitachi: 10 patents #4,206 of 28,497Top 15%
Samsung: 8 patents #15,984 of 75,807Top 25%
NC Nhk Spring Co.: 7 patents #90 of 1,116Top 9%
Fujitsu Limited: 7 patents #4,529 of 24,456Top 20%
HH Hitachi High-Technologies: 6 patents #452 of 1,917Top 25%
Ricoh Company: 5 patents #3,664 of 9,818Top 40%
TL Tokyo Electron Limited: 4 patents #1,723 of 5,567Top 35%
UL Ulvac: 4 patents #97 of 680Top 15%
Mitsubishi Electric: 3 patents #8,691 of 25,717Top 35%
NK Nippon Hoso Kyokai: 3 patents #100 of 703Top 15%
JC Japan Servo Co.: 3 patents #35 of 161Top 25%
TI Toray Industries: 3 patents #932 of 3,690Top 30%
SE Sega Enterprises: 3 patents #74 of 515Top 15%
NI Nitta: 2 patents #54 of 237Top 25%
IC Idemitsu Kosan Co.: 2 patents #509 of 1,237Top 45%
PA Panasonic: 2 patents #9,678 of 21,108Top 50%
DE Denso: 2 patents #4,986 of 11,792Top 45%
KA Kaneka: 2 patents #598 of 1,525Top 40%
MM Mitsubishi Mining: 2 patents #467 of 2,247Top 25%
GL Glory: 2 patents #137 of 385Top 40%
HP Hamamatsu Photonics: 2 patents #41 of 131Top 35%
NI Ngk Insulators: 2 patents #947 of 2,083Top 50%
MC Mitsui Norin Co.: 1 patents #11 of 36Top 35%
ET Elpis Technologies: 1 patents #31 of 121Top 30%
FL Fujitsu Semiconductor Limited: 1 patents #612 of 1,301Top 50%
HG HGST: 1 patents #1,032 of 1,677Top 65%
KS Kabushiki Kaisha Itaya Seisaku Sho: 1 patents #3 of 4Top 75%
MC Max Co.: 1 patents #201 of 321Top 65%
AC Aisin Aw Co.: 1 patents #1,133 of 2,011Top 60%
NP Nec Platforms: 1 patents #114 of 361Top 35%
NS Nidec Servo: 1 patents #45 of 83Top 55%
NE Nippon Telegraph And Telephone East: 1 patents #15 of 43Top 35%
TC Toyo Ink Sc Holdings Co.: 1 patents #51 of 144Top 40%
TC Toyocolor Co.: 1 patents #29 of 71Top 45%
📍 Eastchester, NY: #1 of 70 inventorsTop 2%
🗺 New York: #16 of 115,490 inventorsTop 1%
Overall (All Time): #250 of 4,157,543Top 1%
605
Patents All Time

Issued Patents All Time

Showing 251–275 of 605 patents

Patent #TitleCo-InventorsDate
10734579 Protuberant contacts for resistive switching devices Chih-Chao Yang, Lawrence A. Clevenger 2020-08-04
10734479 FinFET CMOS with asymmetric gate threshold voltage Alexander Reznicek, Choonghyun Lee, Jingyun Zhang, Pouya Hashemi 2020-08-04
10734475 Stacked MIM capacitors with self-aligned contact to reduce via enclosure Robert A. Groves, Hemanth Jagannathan, Lawrence A. Clevenger, Griselda Bonilla 2020-08-04
10734447 Field-effect transistor unit cells for neural networks with differential weights Pouya Hashemi, Alexander Reznicek, Choonghyun Lee, Jingyun Zhang 2020-08-04
10734286 Multiple dielectrics for gate-all-around transistors Jingyun Zhang, Alexander Reznicek, Choonghyun Lee, Pouya Hashemi 2020-08-04
10727407 Resistive switching memory with replacement metal electrode Hiroyuki Miyazoe, Seyoung Kim, Vijay Narayanan 2020-07-28
10720502 Vertical transistors having a layer of charge carriers in the extension region for reduced extension region resistance Pouya Hashemi, Choonghyun Lee, Alexander Reznicek, Jingyun Zhang 2020-07-21
10707304 Vertically stacked nFET and pFET with dual work function Alexander Reznicek, Jingyun Zhang, Choonghyun Lee, Pouya Hashemi 2020-07-07
10700064 Multi-threshold voltage gate-all-around field-effect transistor devices with common gates Jingyun Zhang, Choonghyun Lee 2020-06-30
10699967 Co-integration of high carrier mobility PFET and NFET devices on the same substrate using low temperature condensation Pouya Hashemi, Choonghyun Lee 2020-06-30
10700129 Vertical array of resistive switching devices having a tunable oxygen vacancy concentration Choonghyun Lee 2020-06-30
10692873 Gate formation scheme for nanosheet transistors having different work function metals and different nanosheet width dimensions Ruqiang Bao, Pouya Hashemi, Choonghyun Lee 2020-06-23
10692866 Co-integrated channel and gate formation scheme for nanosheet transistors having separately tuned threshold voltages Jingyun Zhang, Choonghyun Lee, Pouya Hashemi, Alexander Reznicek 2020-06-23
10686076 Germanium condensation for replacement metal gate devices with silicon germanium channel Pouya Hashemi, Choonghyun Lee 2020-06-16
10686040 Artificial synapse with hafnium oxide-based ferroelectric layer in CMOS front-end Martin M. Frank, Xiao Sun, Jin-Ping Han, Vijay Narayanan 2020-06-16
10686039 Artificial synapse with hafnium oxide-based ferroelectric layer in CMOS front-end Martin M. Frank, Xiao Sun, Jin-Ping Han, Vijay Narayanan 2020-06-16
10686014 Semiconductor memory device having a vertical active region Juntao Li, Kangguo Cheng, Dexin Kong 2020-06-16
10672881 Ferroelectric gate dielectric with scaled interfacial layer for steep sub-threshold slope field-effect transistor Martin M. Frank, Vijay Narayanan 2020-06-02
10672671 Distinct gate stacks for III-V-based CMOS circuits comprising a channel cap Martin M. Frank, Renee T. Mo, Vijay Narayanan 2020-06-02
10672984 Resistive memory crossbar array compatible with Cu metallization Michael Rizzolo, Lawrence A. Clevenger, Shyng-Tsong Chen 2020-06-02
10672980 Resistive memory crossbar array with top electrode inner spacers Hiroyuki Miyazoe, Iqbal Rashid Saraf, Shyng-Tsong Chen 2020-06-02
10672891 Stacked gate all around MOSFET with symmetric inner spacer formed via sacrificial pure Si anchors Pouya Hashemi, Choonghyun Lee, Jingyun Zhang 2020-06-02
10658590 Techniques for forming RRAM cells Kangguo Cheng, Juntao Li, Dexin Kong 2020-05-19
10658585 Dedicated contacts for controlled electroforming of memory cells in resistive random-access memory array Lawrence A. Clevenger, Chih-Chao Yang, Benjamin D. Briggs 2020-05-19
10658583 Forming RRAM cell structure with filament confinement Juntao Li, Dexin Kong, Kangguo Cheng 2020-05-19