Issued Patents All Time
Showing 101–119 of 119 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6177228 | Photoresist composition and process for its use | Robert David Allen, Richard Anthony DiPietro, Thomas I. Wallow, Gregory Michael Wallraff | 2001-01-23 |
| 6165678 | Lithographic photoresist composition and process for its use in the manufacture of integrated circuits | Robert David Allen, Richard Anthony DiPietro, Thomas I. Wallow, Gregory Michael Wallraff | 2000-12-26 |
| 6147177 | Polycyclic resist compositions with increased etch resistance | Saikumar Jayaraman, Brian L. Goodall, Larry F. Rhodes, Robert A. Shick, Richard Vicari +3 more | 2000-11-14 |
| 6087064 | Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method | Qinghuang Lin, Marie Angelopoulos, Ahmad D. Katnani | 2000-07-11 |
| 5985524 | Process for using bilayer photoresist | Robert David Allen, Donald C. Hofer, Gregory Michael Wallraff | 1999-11-16 |
| 5962184 | Photoresist composition comprising a copolymer of a hydroxystyrene and a (meth)acrylate substituted with an alicyclic ester substituent | Robert David Allen | 1999-10-05 |
| 5795701 | Making of microlithographic structures with an underlayer film containing a thermolyzed azide compound | Willard E. Conley, James T. Fahey, Wayne M. Moreau, Kevin M. Welsh | 1998-08-18 |
| 5783361 | Microlithographic structure with an underlayer film containing a thermolyzed azide compound | Willard E. Conley, James T. Fahey, Wayne M. Moreau, Kevin M. Welsh | 1998-07-21 |
| 5733705 | Acid Scavengers for use in chemically amplified photoresists | Nageshwer Rao Bantu, William R. Brunsvold, George J. Hefferon, Wu-Song Huang, Ahmad D. Katnani +2 more | 1998-03-31 |
| 5667938 | Acid scavengers for use in chemically amplified photoresists | Nageshwer Rao Bantu, William R. Brunsvold, George J. Hefferon, Wu-Song Huang, Ahmad D. Katnani +2 more | 1997-09-16 |
| 5663036 | Microlithographic structure with an underlayer film comprising a thermolyzed azide | Willard E. Conley, James T. Fahey, Wayne M. Moreau, Kevin M. Welsh | 1997-09-02 |
| 5625020 | Photoresist composition | Gregory Breyta, Christopher J. Knors, Hiroshi Ito | 1997-04-29 |
| 5609989 | Acid scavengers for use in chemically amplified photoresists | Nageshwer Rao Bantu, William R. Brunsvold, George J. Hefferon, Wu-Song Huang, Ahmad D. Katnani +2 more | 1997-03-11 |
| 5554485 | Mid and deep-UV antireflection coatings and methods for use thereof | Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Christopher F. Lyons, Wayne M. Moreau +3 more | 1996-09-10 |
| 5492793 | Photoresist composition | Gregory Breyta, Christopher J. Knors, Hiroshi Ito | 1996-02-20 |
| 5401614 | Mid and deep-UV antireflection coatings and methods for use thereof | Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Christopher F. Lyons, Wayne M. Moreau +3 more | 1995-03-28 |
| 5399462 | Method of forming sub-half micron patterns with optical lithography using bilayer resist compositions comprising a photosensitive polysilsesquioxane | Krishna G. Sachdev, Premlatha Jagannathan, Robert N. Lang, Harbans S. Sachdev, Joel R. Whitaker | 1995-03-21 |
| 5385804 | Silicon containing negative resist for DUV, I-line or E-beam lithography comprising an aromatic azide side group in the polysilsesquioxane polymer | Jagannathan Premlatha, Harbans S. Sachdev | 1995-01-31 |
| 5338818 | Silicon containing positive resist for DUV lithography | William R. Brunsvold, Premlatha Jagannathan, Steve S. Miura, Melvin Montgomery, Harbans S. Sachdev | 1994-08-16 |