Issued Patents All Time
Showing 51–75 of 119 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7989026 | Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films | Joy Cheng, Ho-Cheol Kim, Charles Thomas Rettner, Daniel P. Sanders, Linda Karin Sundberg | 2011-08-02 |
| 7951524 | Self-topcoating photoresist for photolithography | Robert David Allen, Phillip Brock, Shiro Kusumoto, Yukio Nishimura, Daniel P. Sanders +4 more | 2011-05-31 |
| 7951525 | Low outgassing photoresist compositions | Richard Anthony DiPietro, Sally A. Swanson, Hoa D. Truong | 2011-05-31 |
| 7944055 | Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures | Robert David Allen, Phillip Brock, Blake Davis, Wu-Song Huang, Qinghuang Lin +2 more | 2011-05-17 |
| 7927664 | Method of step-and-flash imprint lithography | Richard Anthony DiPietro, Geraud Jean-Michel Dubois, Robert D. Miller | 2011-04-19 |
| 7919225 | Photopatternable dielectric materials for BEOL applications and methods for use | Robert David Allen, Phillip Brock, Blake Davis, Geraud Jean-Michel Dubois, Qinghuang Lin +3 more | 2011-04-05 |
| 7910290 | Photoresist topcoat for a photolithographic process | Robert David Allen, Linda Karin Sundberg | 2011-03-22 |
| 7906031 | Aligning polymer films | Joy Cheng, Daniel P. Sanders | 2011-03-15 |
| 7901864 | Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition | Wu-Song Huang, Marie Angelopoulos, Timothy A. Brunner, Dirk Pfeiffer | 2011-03-08 |
| 7883828 | Functionalized carbosilane polymers and photoresist compositions containing the same | Robert David Allen, Matthew E. Colburn, Daniel P. Sanders, Hoa D. Truong | 2011-02-08 |
| 7867689 | Method of use for photopatternable dielectric materials for BEOL applications | Robert David Allen, Phillip Brock, Blake Davis, Qinghuang Lin, Robert D. Miller +1 more | 2011-01-11 |
| 7824845 | Functionalized carbosilane polymers and photoresist compositions containing the same | Robert David Allen, Matthew E. Colburn, Daniel P. Sanders, Hoa D. Truong | 2010-11-02 |
| 7820369 | Method for patterning a low activation energy photoresist | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Hoa D. Truong +1 more | 2010-10-26 |
| 7759044 | Low activation energy dissolution modification agents for photoresist applications | Robert David Allen, Phillip Brock, Richard Anthony DiPietro, Hoa D. Truong | 2010-07-20 |
| 7714079 | Patternable low dielectric constant materials and their use in ULSI interconnection | Qinghuang Lin | 2010-05-11 |
| 7709370 | Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures | Robert David Allen, Phillip Brock, Blake Davis, Wu-Song Huang, Qinghuang Lin +2 more | 2010-05-04 |
| 7622240 | Low blur molecular resist | Hoa D. Truong | 2009-11-24 |
| 7563558 | Negative resists based on acid-catalyzed elimination of polar molecules | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, David R. Medeiros | 2009-07-21 |
| 7550254 | Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions | Robert David Allen, Debra Fenzel-Alexander | 2009-06-23 |
| 7521090 | Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films | Joy Cheng, Ho-Cheol Kim, Charles Thomas Rettner, Daniel P. Sanders, Linda Karin Sundberg | 2009-04-21 |
| 7521172 | Topcoat material and use thereof in immersion lithography processes | Robert Allen David, Phillip Brock, Sean D. Burns, Dario L. Goldfarb, David R. Medeiros +3 more | 2009-04-21 |
| 7476492 | Low activation energy photoresist composition and process for its use | Robert David Allen, Richard Anthony DiPietro, Hoa D. Truong | 2009-01-13 |
| 7468330 | Imprint process using polyhedral oligomeric silsesquioxane based imprint materials | Robert David Allen, Richard Anthony DiPietro, Geraud Jean-Michel Dubois, Mark Whitney Hart, Robert D. Miller | 2008-12-23 |
| 7399581 | Photoresist topcoat for a photolithographic process | Robert David Allen, Linda Karin Sundberg | 2008-07-15 |
| 7393624 | Negative resists based on acid-catalyzed elimination of polar molecules | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, David R. Medeiros | 2008-07-01 |