Issued Patents All Time
Showing 76–100 of 119 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7358029 | Low activation energy dissolution modification agents for photoresist applications | Robert David Allen, Phillip Brock, Richard Anthony DiPietro, Hoa D. Truong | 2008-04-15 |
| 7306853 | Patternable low dielectric constant materials and their use in ULSI interconnection | Qinghuang Lin | 2007-12-11 |
| 7300739 | Negative resists based on a acid-catalyzed elimination of polar molecules | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, David R. Medeiros | 2007-11-27 |
| 7270931 | Silicon-containing compositions for spin-on ARC/hardmask materials | Marie Angelopoulos, Wu-Song Huang, Arpan P. Mahorowila, Wayne M. Moreau, Dirk Pfeiffer | 2007-09-18 |
| 7261992 | Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions | Robert David Allen, Debra Fenzel-Alexander | 2007-08-28 |
| 7193023 | Low activation energy photoresists | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Hoa D. Truong +1 more | 2007-03-20 |
| 7141692 | Molecular photoresists containing nonpolymeric silsesquioxanes | Robert David Allen, Wu-Song Huang, Mahmoud Khojasteh, Qinghuang Lin, Dirk Pfeiffer +1 more | 2006-11-28 |
| 7135595 | Photoresist composition | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Debra Fenzel-Alexander +5 more | 2006-11-14 |
| 7041748 | Patternable low dielectric constant materials and their use in ULSI interconnection | Qinghuang Lin | 2006-05-09 |
| 7014980 | Photoresist composition | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Debra Fenzel-Alexander +5 more | 2006-03-21 |
| 6939664 | Low-activation energy silicon-containing resist system | Wu-Song Huang, Robert David Allen, Marie Angelopoulos, Ranee W. Kwong | 2005-09-06 |
| 6927015 | Underlayer compositions for multilayer lithographic processes | Mahmoud Khojasteh, Timothy Hughes, Ranee W. Kwong, Pushkara R. Varanasi, William R. Brunsvold +4 more | 2005-08-09 |
| 6818381 | Underlayer compositions for multilayer lithographic processes | Mahmoud Khojasteh, Timothy Hughes, Ranee W. Kwong, Pushkara R. Varanasi, William R. Brunsvold +4 more | 2004-11-16 |
| 6806026 | Photoresist composition | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Debra Fenzel-Alexander +5 more | 2004-10-19 |
| 6794459 | Modified polycyclic polymers | Saikumar Jayaraman, George M. Benedikt, Larry F. Rhodes, Richard Vicari, Robert David Allen +2 more | 2004-09-21 |
| 6770419 | Low silicon-outgassing resist for bilayer lithography | Mahmoud Khojasteh, Ranee W. Kwong, Kuang-Jung Chen, Pushkara R. Varanasi, Robert David Allen +2 more | 2004-08-03 |
| 6730454 | Antireflective SiO-containing compositions for hardmask layer | Dirk Pfeiffer, Marie Angelopoulos, Katherina Babich, Phillip Brock, Wu-Song Huang +2 more | 2004-05-04 |
| 6653048 | High silicon content monomers and polymers suitable for 193 nm bilayer resists | Phillip Brock, Richard Anthony DiPietro, Donald C. Hofer, Gregory Michael Wallraff | 2003-11-25 |
| RE38282 | Process for using bilayer photoresist | Robert David Allen, Donald C. Hofer, Gregory Michael Wallraff | 2003-10-21 |
| 6451499 | Polycyclic resist compositions with increased etch resistance | Saikumar Jayaraman, Brian L. Goodall, Larry F. Rhodes, Robert A. Shick, Richard Vicari +3 more | 2002-09-17 |
| 6451945 | Modified polycyclic polymers | Saikumar Jayaraman, George M. Benedikt, Larry F. Rhodes, Richard Vicari, Robert David Allen +2 more | 2002-09-17 |
| 6444408 | High silicon content monomers and polymers suitable for 193 nm bilayer resists | Phillip Brock, Richard Anthony DiPietro, Donald C. Hofer, Gregory Michael Wallraff | 2002-09-03 |
| 6420503 | Norbornene sulfonamide polymers | Saikumar Jayaraman, Richard Vicari, Larry F. Rhodes, Pushkara R. Varanasi, Thomas I. Wallow +4 more | 2002-07-16 |
| 6340734 | Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method | Qinghuang Lin, Marie Angelopoulos, Ahmad D. Katnani | 2002-01-22 |
| 6277546 | Process for imaging of photoresist | Gregory Breyta, Nicholas J. Clecak, William D. Hinsberg, Donald C. Hofer, Hiroshi Ito +1 more | 2001-08-21 |