Issued Patents All Time
Showing 151–175 of 213 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7865864 | Electrically driven optical proximity correction | Shayak Banerjee, James A. Culp, Praveen Elakkumanan | 2011-01-04 |
| 7765021 | Method to check model accuracy during wafer patterning simulation | Scott M. Mansfield, Mohamed Talbi | 2010-07-27 |
| 7687207 | System for coloring a partially colored design in an alternating phase shift mask | Ioana Graur, Young Ouk Kim, Mark A. Lavin | 2010-03-30 |
| 7650587 | Local coloring for hierarchical OPC | Zachary Baum, Ioana Graur, Scott M. Mansfield | 2010-01-19 |
| 7627836 | OPC trimming for performance | James A. Culp, Rajeev Malik, K. Paul Muller, Shreesh Narasimha, Stephen L. Runyon +1 more | 2009-12-01 |
| 7624369 | Closed-loop design for manufacturability process | Ioana Graur, Geng Han, Scott M. Mansfiled | 2009-11-24 |
| 7617473 | Differential alternating phase shift mask optimization | Zachary Baum | 2009-11-10 |
| 7607114 | Designer's intent tolerance bands for proximity correction and checking | Scott M. Mansfield, Azalia Krasnoperova, Ioana Graur | 2009-10-20 |
| 7536664 | Physical design system and method | John M. Cohn, James A. Culp, Ulrich A. Finkler, Fook-Luen Heng, Mark A. Lavin +6 more | 2009-05-19 |
| 7503028 | Multilayer OPC for design aware manufacturing | Maharaj Mukherjee, James A. Culp, Scott M. Mansfield | 2009-03-10 |
| 7473648 | Double exposure double resist layer process for forming gate patterns | Timothy A. Brunner, James A. Culp | 2009-01-06 |
| 7475380 | Generating mask patterns for alternating phase-shift mask lithography | Scott Bukofsky, Ioana Graur | 2009-01-06 |
| 7470489 | Method for designing alternating phase shift masks | Carlos A. Fonseca | 2008-12-30 |
| 7378195 | System for coloring a partially colored design in an alternating phase shift mask | Ioana Graur, Young Ouk Kim, Mark A. Lavin | 2008-05-27 |
| 7346887 | Method for fabricating integrated circuit features | Jochen Beintner | 2008-03-18 |
| 7266798 | Designer's intent tolerance bands for proximity correction and checking | Scott M. Mansfield, Azalia Krasnoperova, Ioana Graur | 2007-09-04 |
| 7261981 | System and method of smoothing mask shapes for improved placement of sub-resolution assist features | Mark A. Lavin, Scott M. Mansfield, Maharaj Mukherjee, Zengqin Zhao | 2007-08-28 |
| 7229722 | Alternating phase shift mask design for high performance circuitry | Zachary Baum | 2007-06-12 |
| 7175942 | Method of conflict avoidance in fabrication of gate-shrink alternating phase shifting masks | Ioana Graur | 2007-02-13 |
| 7147976 | Binary OPC for assist feature layout optimization | Richard A. Ferguson, Allen H. Gabor, Mark A. Lavin | 2006-12-12 |
| 7135255 | Layout impact reduction with angled phase shapes | Scott Bukofsky, John K. DeBrosse, Marco Hug, Daniel J. Nickel, Juergen Preuninger | 2006-11-14 |
| 7115343 | Pliant SRAF for improved performance and manufacturability | Ronald Gordon, Ioana Graur | 2006-10-03 |
| 7001693 | Binary OPC for assist feature layout optimization | Richard A. Ferguson, Allen H. Gabor, Mark A. Lavin | 2006-02-21 |
| 6996797 | Method for verification of resolution enhancement techniques and optical proximity correction in lithography | James A. Culp, Ioana Graur, Maharaj Mukherjee | 2006-02-07 |
| 6993741 | Generating mask patterns for alternating phase-shift mask lithography | Scott Bukofsky, Ioana Graur | 2006-01-31 |