Issued Patents All Time
Showing 176–200 of 213 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6964032 | Pitch-based subresolution assist feature design | Allen H. Gabor, Ronald Gordon, Carlos A. Fonseca, Martin Burkhardt | 2005-11-08 |
| 6927005 | Alternating phase shift mask design with optimized phase shapes | Carlos A. Fonseca, Ioana Graur, Mark A. Lavin | 2005-08-09 |
| 6901576 | Phase-width balanced alternating phase shift mask design | Carlos A. Fonseca, Ioana Graur | 2005-05-31 |
| 6832364 | Integrated lithographic layout optimization | Fook-Luen Heng | 2004-12-14 |
| 6824932 | Self-aligned alternating phase shift mask patterning process | Scott Bukofsky, Carlos A. Fonseca, Michael S. Hibbs | 2004-11-30 |
| 6795961 | Priority coloring for VLSI designs | Carlos A. Fonseca, Ioana Graur, Young Ouk Kim | 2004-09-21 |
| 6757886 | Alternating phase shift mask design with optimized phase shapes | Carlos A. Fonseca, Ioana Graur, Mark A. Lavin | 2004-06-29 |
| 6609245 | Priority coloring for VLSI designs | Carlos A. Fonseca, Ioana Graur, Young Ouk Kim | 2003-08-19 |
| 6602728 | Method for generating a proximity model based on proximity rules | Scott M. Mansfield, Alfred Wong | 2003-08-05 |
| 6596442 | Asymmetric halftone biasing for sub-grid pattern adjustment | Alfred Wong, Richard A. Ferguson | 2003-07-22 |
| 6578190 | Process window based optical proximity correction of lithographic images | Richard A. Ferguson, Mark A. Lavin, Alfred Wong | 2003-06-10 |
| 6553559 | Method to determine optical proximity correction and assist feature rules which account for variations in mask dimensions | Scott M. Mansfield, Alfred Wong | 2003-04-22 |
| 6421820 | Semiconductor device fabrication using a photomask with assist features | Scott M. Mansfield, Shahid Butt, Henning Haffner | 2002-07-16 |
| 6413683 | Method for incorporating sub resolution assist features in a photomask layout | Scott M. Mansfield | 2002-07-02 |
| 6338922 | Optimized alternating phase shifted mask design | Alfred Wong | 2002-01-15 |
| 6277527 | Method of making a twin alternating phase shift mask | David S. O'Grady | 2001-08-21 |
| 6185727 | Design verification for asymmetric phase shift mask layouts | — | 2001-02-06 |
| 6083275 | Optimized phase shift design migration | Fook-Luen Heng | 2000-07-04 |
| 6066180 | Automatic generation of phase shift masks using net coloring | Young Ouk Kim, Mark A. Lavin, Glenwood S. Weinert | 2000-05-23 |
| 6057063 | Phase shifted mask design system, phase shifted mask and VLSI circuit devices manufactured therewith | Ioana Graur, Young Ouk Kim, Mark A. Lavin, Alfred Wong | 2000-05-02 |
| 6055367 | Semiconductor device compensation system and method | Robert T. Sayah | 2000-04-25 |
| 5936738 | Focus monitor for alternating phase shifted masks | Richard A. Ferguson | 1999-08-10 |
| 5932377 | Exact transmission balanced alternating phase-shifting mask for photolithography | Richard A. Ferguson, Scott M. Mansfield, David S. O'Grady, Alfred Wong | 1999-08-03 |
| 5923566 | Phase shifted design verification routine | Gérald Galan, Ioana Graur | 1999-07-13 |
| 5923562 | Method for automatically eliminating three way intersection design conflicts in phase edge, phase shift designs | Robert T. Sayah | 1999-07-13 |