Issued Patents All Time
Showing 51–75 of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10629499 | Method and structure for forming a vertical field-effect transistor using a replacement metal gate process | Choonghyun Lee, Kangguo Cheng | 2020-04-21 |
| 10361281 | Method to improve reliability of replacement gate device | Takashi Ando, Eduard A. Cartier, Vijay Narayanan | 2019-07-23 |
| 9972697 | Method to improve reliability of replacement gate device | Takashi Ando, Eduard A. Cartier, Vijay Narayanan | 2018-05-15 |
| 9960252 | Method to improve reliability of replacement gate device | Takashi Ando, Eduard A. Cartier, Vijay Narayanan | 2018-05-01 |
| 9953978 | Replacement gate structures for transistor devices | Ruilong Xie, Su Chen Fan, Shom Ponoth | 2018-04-24 |
| 9666690 | Integrated circuit and method for fabricating the same having a replacement gate structure | Hoon Kim | 2017-05-30 |
| 9607904 | Atomic layer deposition of HfAlC as a metal gate workfunction material in MOS devices | Albert S. Lee, Paul R. Besser, Edward Haywood, Hoon Kim, Salil Mujumdar | 2017-03-28 |
| 9496143 | Metal gate structure for midgap semiconductor device and method of making same | Hoon Kim | 2016-11-15 |
| 9484438 | Method to improve reliability of replacement gate device | Takashi Ando, Eduard A. Cartier, Vijay Narayanan | 2016-11-01 |
| 9472643 | Method to improve reliability of replacement gate device | Takashi Ando, Eduard A. Cartier, Vijay Narayanan | 2016-10-18 |
| 9466692 | Method to improve reliability of replacement gate device | Takashi Ando, Eduard A. Cartier, Vijay Narayanan | 2016-10-11 |
| 9455203 | Low threshold voltage CMOS device | Takashi Ando, Changhwan Choi, Vijay Narayanan | 2016-09-27 |
| 9431507 | Replacement gate structure with low-K sidewall spacer for semiconductor devices | Ruilong Xie | 2016-08-30 |
| 9391164 | Method to improve reliability of replacement gate device | Takashi Ando, Eduard A. Cartier, Vijay Narayanan | 2016-07-12 |
| 9362283 | Gate structures for transistor devices for CMOS applications and products | Zhendong Hong, Susie Tzeng, Amol Joshi, Ashish Bodke, Divya Pisharoty +6 more | 2016-06-07 |
| 9349823 | Methods of scaling thickness of a gate dielectric structure, methods of forming an integrated circuit, and integrated circuits | — | 2016-05-24 |
| 9287130 | Method for single fin cuts using selective ion implants | Xiuyu Cai, Ajey Poovannummoottil Jacob, Ruilong Xie, Bruce B. Doris, Kangguo Cheng +7 more | 2016-03-15 |
| 9263344 | Low threshold voltage CMOS device | Takashi Ando, Changhwan Choi, Vijay Narayanan | 2016-02-16 |
| 9257348 | Methods of forming replacement gate structures for transistors and the resulting devices | Ruilong Xie, Su Chen Fan, Shom Ponoth | 2016-02-09 |
| 9245968 | Field effect transistor and method of fabrication | Hoon Kim, Chanro Park | 2016-01-26 |
| 9224610 | Integrated circuits having improved high-K dielectric layers and methods for fabrication of same | Hoon Kim | 2015-12-29 |
| 9224638 | Integrated circuits with metal-titanium oxide contacts and fabrication methods | Hiroaki Niimi, Hoon Kim, Andy Wei, Guillaume Bouche | 2015-12-29 |
| 9218975 | Methods of forming a replacement gate structure having a gate electrode comprised of a deposited intermetallic compound material | Mark V. Raymond | 2015-12-22 |
| 9165928 | Methods of forming gate structures for CMOS based integrated circuit products and the resulting devices | Ruilong Xie | 2015-10-20 |
| 9105497 | Methods of forming gate structures for transistor devices for CMOS applications | Zhendong Hong, Susie Tzeng, Amol Joshi, Ashish Bodke, Divya Pisharoty +6 more | 2015-08-11 |