BB

Benjamin D. Briggs

IBM: 162 patents #252 of 70,183Top 1%
TE Tessera: 19 patents #21 of 271Top 8%
Applied Materials: 6 patents #1,918 of 7,310Top 30%
AS Adeia Semiconductor Solutions: 3 patents #3 of 57Top 6%
📍 Pleasantdale, NY: #1 of 14 inventorsTop 8%
🗺 New York: #162 of 115,490 inventorsTop 1%
Overall (All Time): #3,751 of 4,157,543Top 1%
190
Patents All Time

Issued Patents All Time

Showing 101–125 of 190 patents

Patent #TitleCo-InventorsDate
10424456 Fold over emitter and collector field emission transistor Lawrence A. Clevenger, Michael Rizzolo 2019-09-24
10404306 Paint on micro chip touch screens Maryam Ashoori, Justin A. Canaperi, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Michael Rizzolo +1 more 2019-09-03
10395986 Fully aligned via employing selective metal deposition James J. Kelly, Donald F. Canaperi, Michael Rizzolo, Lawrence A. Clevenger 2019-08-27
10395977 Self aligned via and pillar cut for at least a self aligned double pitch Lawrence A. Clevenger, Michael Rizzolo, Terry A. Spooner, Theodorus E. Standaert 2019-08-27
10381561 Dedicated contacts for controlled electroforming of memory cells in resistive random-access memory array Takashi Ando, Lawrence A. Clevenger, Chih-Chao Yang 2019-08-13
10366920 Location-specific laser annealing to improve interconnect microstructure Lawrence A. Clevenger, Bartlet H. DeProspo, Michael Rizzolo 2019-07-30
10366952 Semiconductor device including a porous dielectric layer, and method of forming the semiconductor device Lawrence A. Clevenger, Bartlet H. DeProspo, Huai Huang, Christopher J. Penny, Michael Rizzolo 2019-07-30
10361157 Method of manufacturing self-aligned interconnects by deposition of a non-conformal air-gap forming layer having an undulated upper surface Lawrence A. Clevenger, Christopher J. Penny, Michael Rizzolo 2019-07-23
10361117 Selective ILD deposition for fully aligned via with airgap Christopher J. Penny, Huai Huang, Lawrence A. Clevenger, Michael Rizzolo, Hosadurga Shobha 2019-07-23
10347825 Selective deposition and nitridization of bottom electrode metal for MRAM applications Joe Lee, Christopher J. Penny, Michael Rizzolo, Chih-Chao Yang 2019-07-09
10315451 Structure, system, method, and recording medium of implementing a directed self-assembled security pattern Lawrence A. Clevenger, Bartlet H. DeProspo, Michael Rizzolo 2019-06-11
10319783 Integrated magnetic tunnel junction (MTJ) in back end of line (BEOL) interconnects Michael Rizzolo, Theodorus E. Standaert 2019-06-11
10312434 Selective deposition and nitridization of bottom electrode metal for MRAM applications Joe Lee, Christopher J. Penny, Michael Rizzolo, Chih-Chao Yang 2019-06-04
10297750 Wraparound top electrode line for crossbar array resistive switching device Takashi Ando, Lawrence A. Clevenger, Michael Rizzolo, Chih-Chao Yang 2019-05-21
10290541 Barrier layers in trenches and vias Lawrence A. Clevenger, Cornelius Brown Peethala, Michael Rizzolo, Chih-Chao Yang 2019-05-14
10276436 Selective recessing to form a fully aligned via Jessica Dechene, Elbert E. Huang, Joe Lee, Theodorus E. Standaert 2019-04-30
10276190 Sentiment analysis of mental health disorder symptoms Maryam Ashoori, Lawrence A. Clevenger, Leigh Anne H. Clevenger 2019-04-30
10276053 Cognitive system to improve athletic performance with motivation from different training styles Lawrence A. Clevenger, Leigh Anne H. Clevenger, Jonathan H. Connell, II, Nalini K. Ratha, Michael Rizzolo 2019-04-30
10256191 Hybrid dielectric scheme for varying liner thickness and manganese concentration Lawrence A. Clevenger, Nicholas Anthony Lanzillo, Takeshi Nogami, Christopher J. Penny, Michael Rizzolo 2019-04-09
10242909 Wet etch removal of Ru selective to other metals Cornelius Brown Peethala, David L. Rath 2019-03-26
10229967 High-density MIM capacitors Lawrence A. Clevenger, Bartlet H. DeProspo, Huai Huang, Christopher J. Penny, Michael Rizzolo 2019-03-12
10229851 Self-forming barrier for use in air gap formation Elbert E. Huang, Takeshi Nogami, Christopher J. Penny 2019-03-12
10211155 Reducing metallic interconnect resistivity through application of mechanical strain Lawrence A. Clevenger, Nicholas Anthony Lanzillo, Michael Rizzolo, Theodorus E. Standaert 2019-02-19
10211153 Low aspect ratio interconnect Elbert E. Huang, Raghuveer R. Patlolla, Cornelius Brown Peethala, David L. Rath, Chih-Chao Yang 2019-02-19
10211151 Enhanced self-alignment of vias for asemiconductor device Lawrence A. Clevenger, Bartlet H. DeProspo, Michael Rizzolo, Nicole Saulnier 2019-02-19