BB

Benjamin D. Briggs

IBM: 162 patents #252 of 70,183Top 1%
TE Tessera: 19 patents #21 of 271Top 8%
Applied Materials: 6 patents #1,918 of 7,310Top 30%
AS Adeia Semiconductor Solutions: 3 patents #3 of 57Top 6%
📍 Pleasantdale, NY: #1 of 14 inventorsTop 8%
🗺 New York: #162 of 115,490 inventorsTop 1%
Overall (All Time): #3,751 of 4,157,543Top 1%
190
Patents All Time

Issued Patents All Time

Showing 26–50 of 190 patents

Patent #TitleCo-InventorsDate
11263068 Proximity correction in three-dimensional manufacturing Lawrence A. Clevenger, Leigh Anne H. Clevenger, Christopher J. Penny, Michael Rizzolo, Aldis Sipolins 2022-03-01
11257717 Selective recessing to form a fully aligned via Jessica Dechene, Elbert E. Huang, Joe Lee, Theodorus E. Standaert 2022-02-22
11195993 Encapsulation topography-assisted self-aligned MRAM top contact Michael Rizzolo, Nicholas Anthony Lanzillo, Lawrence A. Clevenger 2021-12-07
11164377 Motion-controlled portals in virtual reality Aldis Sipolins, Lawrence A. Clevenger, Michael Rizzolo, Christopher J. Penny, Patrick Watson 2021-11-02
11158584 Selective CVD alignment-mark topography assist for non-volatile memory Michael Rizzolo, Chih-Chao Yang, Lawrence A. Clevenger 2021-10-26
11138890 Secure access for drone package delivery Lawrence A. Clevenger, Leigh Anne H. Clevenger, Christopher J. Penny, Michael Rizzolo, Aldis Sipolins 2021-10-05
11132712 Method for using 3D positional spatial olfaction for virtual marketing Lawrence A. Clevenger, Leigh Anne H. Clevenger, Christoper J. Penny, Michael Rizzolo, Aldis Sipolins 2021-09-28
11101172 Dielectric damage-free dual damascene Cu interconnects without barrier at via bottom Koichi Motoyama, Gangadhara Raja Muthinti, Cornelius Brown Peethala, Lawrence A. Clevenger 2021-08-24
11081388 Forming barrierless contact Kisik Choi, Koichi Motoyama, Ashim Dutta, Iqbal Rashid Saraf 2021-08-03
11056429 Semiconductor device including a porous dielectric layer, and method of forming the semiconductor device Lawrence A. Clevenger, Bartlet H. DeProspo, Huai Huang, Christopher J. Penny, Michael Rizzolo 2021-07-06
11049744 Optimizing semiconductor binning by feed-forward process adjustment Lawrence A. Clevenger, Nicholas Anthony Lanzillo, Michael Rizzolo, Theodorus E. Standaert, James H. Stathis 2021-06-29
11018090 Selective CVD alignment-mark topography assist for non-volatile memory Michael Rizzolo, Chih-Chao Yang, Lawrence A. Clevenger 2021-05-25
11004790 Method of manufacturing an interconnect without dielectric exclusion zones by thermal decomposition of a sacrificial filler material Lawrence A. Clevenger, Christopher J. Penny, Michael Rizzolo 2021-05-11
10991619 Top via process accounting for misalignment by increasing reliability Chen Zhang, Lawrence A. Clevenger, Brent A. Anderson, Chih-Chao Yang 2021-04-27
10985056 Structure and method to improve FAV RIE process margin and Electromigration Joe Lee, Theodorus E. Standaert 2021-04-20
10978393 Hybrid dielectric scheme for varying liner thickness and manganese concentration Lawrence A. Clevenger, Nicholas Anthony Lanzillo, Takeshi Nogami, Christopher J. Penny, Michael Rizzolo 2021-04-13
10978342 Interconnect with self-forming wrap-all-around barrier layer Huai Huang, Takeshi Nogami, Alfred Grill, Nicholas Anthony Lanzillo, Christian Lavoie +3 more 2021-04-13
10971030 Remote physical training Lawrence A. Clevenger, Leigh Anne H. Clevenger, Christopher J. Penny, Michael Rizzolo, Aldis Sipolins 2021-04-06
10964588 Selective ILD deposition for fully aligned via with airgap Christopher J. Penny, Huai Huang, Lawrence A. Clevenger, Michael Rizzolo, Hosadurga Shobha 2021-03-30
10957646 Hybrid BEOL metallization utilizing selective reflection mask Cornelius Brown Peethala, Michael Rizzolo, Koichi Motoyama, Gen Tsutsui, Ruqiang Bao +2 more 2021-03-23
10957584 Structure and method to improve FAV RIE process margin and electromigration Joe Lee, Theodorus E. Standaert 2021-03-23
10957582 Self aligned via and pillar cut for at least a self aligned double pitch Lawrence A. Clevenger, Michael Rizzolo, Terry A. Spooner, Theodorus E. Standaert 2021-03-23
10957581 Self aligned via and pillar cut for at least a self aligned double pitch Lawrence A. Clevenger, Michael Rizzolo, Terry A. Spooner, Theodorus E. Standaert 2021-03-23
10943866 Method and structure to construct cylindrical interconnects to reduce resistance Michael Rizzolo, Christopher J. Penny, Huai Huang, Lawrence A. Clevenger, Hosadurga Shobha 2021-03-09
10916501 Back end of line electrical fuse structure and method of fabrication Lawrence A. Clevenger, Michael Rizzolo, Chih-Chao Yang 2021-02-09