Issued Patents All Time
Showing 26–50 of 76 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8742342 | Electron microscope | Nobuhiro Okai | 2014-06-03 |
| 8735814 | Electron beam device | Takeyoshi Ohashi, Tasuku Yano, Muneyuki Fukuda, Noritsugu Takahashi | 2014-05-27 |
| 8704175 | Scanning electron microscope | Hiromasa Yamanashi, Muneyuki Fukuda, Takeyoshi Ohashi, Osamu Komuro | 2014-04-22 |
| 8637820 | Scanning electron microscope and inspection method using same | Takeyoshi Ohashi, Kaori Shirahata, Keiichiro Hitomi | 2014-01-28 |
| 8575547 | Electron beam measurement apparatus | Shoji Hotta, Shinji Okazaki, Muneyuki Fukuda | 2013-11-05 |
| 8478021 | Charged beam device | Kaori Shirahata, Yoshinori Nakayama, Keiichiro Hitomi, Muneyuki Fukuda | 2013-07-02 |
| 8268209 | Pattern forming method and its mold | Masahiko Ogino, Akihiro Miyauchi, Takashi Ando, Chiseki Haginoya, Susumu Komoriya +3 more | 2012-09-18 |
| 8263929 | Standard member for correction, scanning electron microscope using same, and scanning electron microscope correction method | Yoshinori Nakayama, Keiichiro Hitomi | 2012-09-11 |
| 8125518 | Scanning electron microscope | Nobuhiro Okai | 2012-02-28 |
| 8064681 | Method and apparatus for inspecting reticle | Nobuhiro Okai, Shinji Okazaki, Yoshinori Nakayama | 2011-11-22 |
| 7943903 | Defect inspection method and its system | Shinji Okazaki, Shoji Hotta, Yoshinori Nakayama | 2011-05-17 |
| 7884325 | Electron beam measurement apparatus | Shoji Hotta, Shinji Okazaki, Muneyuki Fukuda | 2011-02-08 |
| 7875850 | Standard component for calibration and electron-beam system using the same | Yoshinori Nakayama, Keiichiro Hitomi | 2011-01-25 |
| 7750296 | Scanning electron microscope and calibration of image distortion | Keiichiro Hitomi, Yoshinori Nakayama, Hajime Koyanagi | 2010-07-06 |
| 7745237 | Pattern forming method and pattern forming system | Souichi Katagiri, Masahiko Ogino | 2010-06-29 |
| 7683313 | Charged particle beam measurement equipment, size correction and standard sample for correction | Yoshinori Nakayama, Hajime Koyanagi, Keiichiro Hitomi | 2010-03-23 |
| 7679056 | Metrology system of fine pattern for process control by charged particle beam | Hiromasa Yamanashi, Muneyuki Fukuda, Sayaka Tanimoto | 2010-03-16 |
| 7655907 | Charged particle beam apparatus and pattern measuring method | Sayaka Tanimoto, Hiromasa Yamanashi, Muneyuki Fukuda | 2010-02-02 |
| 7612334 | Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the same | Yoshinori Nakayama, Keiichiro Hitomi, Hajime Koyanagi | 2009-11-03 |
| 7476882 | Calibration method for electron-beam system and electron-beam system | Yoshinori Nakayama | 2009-01-13 |
| 7425714 | Measurement method of electron beam current, electron beam writing system and electron beam detector | Makoto Sakakibara, Yoshinori Nakayama, Hiroya Ohta, Noriyuki Tanaka, Yasuhiro Someda | 2008-09-16 |
| 7423274 | Electron beam writing system and electron beam writing method | Yoshinori Nakayama, Hiroya Ohta, Makoto Sakakibara, Masaki Hosoda | 2008-09-09 |
| 7385194 | Charged particle beam application system | Osamu Kamimura, Tadashi Kanosue, Susumu Goto | 2008-06-10 |
| 7378668 | Method and apparatus for applying charged particle beam | Sayaka Tanimoto, Yasuhiro Someda, Masaki Hosoda | 2008-05-27 |
| 7105842 | Method of charged particle beam lithography and equipment for charged particle beam lithography | Sayaka Tanimoto, Yoshinori Nakayama, Osamu Kamimura, Haruo Yoda, Masaki Hosoda | 2006-09-12 |