Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10037866 | Charged particle beam apparatus | Momoyo Enyama, Muneyuki Fukuda, Hideyuki Kazumi, Koichi Hamada | 2018-07-31 |
| 9287082 | Charged particle beam apparatus | Kenichi Morita, Makoto Sakakibara, Muneyuki Fukuda, Naomasa Suzuki, Kenji Obara | 2016-03-15 |
| 8193493 | Charged particle beam apparatus | Hiroya Ohta, Hiroshi Makino, Ryuichi Funatsu | 2012-06-05 |
| 8026482 | Charged particle beam apparatus and control method therefor | Muneyuki Fukuda, Hiromasa Yamanashi, Yasunari Souda, Osamu Nasu | 2011-09-27 |
| 7906761 | Charged particle beam apparatus | Hiroya Ohta, Hiroshi Makino, Ryuichi Funatsu | 2011-03-15 |
| 7880143 | Electron beam apparatus | Hiroya Ohta, Hiroshi Makino, Ryuichi Funatsu | 2011-02-01 |
| 7679056 | Metrology system of fine pattern for process control by charged particle beam | Hiromasa Yamanashi, Muneyuki Fukuda, Yasunari Sohda | 2010-03-16 |
| 7655907 | Charged particle beam apparatus and pattern measuring method | Hiromasa Yamanashi, Muneyuki Fukuda, Yasunari Sohda | 2010-02-02 |
| 7408760 | Charged particle beam application system | Yasunari Soda, Masakazu Sugaya, Hiroshi Tooyama, Takeshi Tsutsumi, Yasuhiro Someda | 2008-08-05 |
| 7378668 | Method and apparatus for applying charged particle beam | Yasunari Sohda, Yasuhiro Someda, Masaki Hosoda | 2008-05-27 |
| 7276709 | System and method for electron-beam lithography | Yoshimasa Fukushima, Hiroshi Tsuji | 2007-10-02 |
| 7105842 | Method of charged particle beam lithography and equipment for charged particle beam lithography | Yasunari Sohda, Yoshinori Nakayama, Osamu Kamimura, Haruo Yoda, Masaki Hosoda | 2006-09-12 |
| 7098464 | Electron beam writing equipment and electron beam writing method | Yasunari Sohda, Osamu Kamimura, Yoshinori Nakayama, Masato Muraki | 2006-08-29 |
| 7060984 | Multi-charged beam lens and charged beam exposure apparatus using the same | Kenichi Nagae, Haruhito Ono | 2006-06-13 |
| 6870310 | Multibeam generating apparatus and electron beam drawing apparatus | Masahiko Okunuki, Hiroya Ohta, Norio Saito, Masaki Takakuwa, Takeshi Haraguchi | 2005-03-22 |