Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8491291 | Pattern transfer method and imprint device | Takashi Ando, Masahiko Ogino, Akihiro Miyauchi | 2013-07-23 |
| 8268209 | Pattern forming method and its mold | Masahiko Ogino, Akihiro Miyauchi, Takashi Ando, Chiseki Haginoya, Yasunari Sohda +3 more | 2012-09-18 |
| 8133418 | Pattern transfer method and imprint device | Takashi Ando, Masahiko Ogino, Akihiro Miyauchi | 2012-03-13 |
| 8109751 | Imprint device and microstructure transfer method | Takashi Ando, Masahiko Ogino, Akihiro Miyauchi | 2012-02-07 |
| 8096802 | Nanoimprint stamper and a fine-structure transfer apparatus using the stamper | Kyoichi Mori, Noritake Shizawa, Akihiro Miyauchi, Takashi Ando, Tetsuhiro Hatogai | 2012-01-17 |
| 8092209 | Imprinting device | Takashi Ando, Noritake Shizawa, Kyoichi Mori | 2012-01-10 |
| 8016585 | Nanoimprint resin stamper | Kyoichi Mori, Noritake Shizawa, Takanori Yamasaki, Tetsuhiro Hatogai, Koji Tsushima | 2011-09-13 |
| RE40139 | Wafer having chamfered bend portions in the joint regions between the contour of the cut-away portion of the wafer | Hisashi Maejima, Hiroshi Nishizuka, Etuo Egashira | 2008-03-04 |
| 5747201 | Controlling method of forming thin film, system for said controlling method, exposure method and system for said exposure method | Yasuhiko Nakayama, Masataka Shiba | 1998-05-05 |
| 5432608 | Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same | Takao Kawanabe, Shinya Nakagawa, Takayoshi Oosakaya, Nobuyuki Iriki | 1995-07-11 |
| 5409538 | Controlling method of forming thin film, system for said controlling method, exposure method and system for said exposure method | Yasuhiko Nakayama, Masataka Shiba | 1995-04-25 |
| 5279992 | Method of producing a wafer having a curved notch | Hisashi Maejima, Hiroshi Nishizuka, Etuo Egashira | 1994-01-18 |
| 5260771 | Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same | Takao Kawanabe, Shinya Nakagawa, Takayoshi Oosakaya, Nobuyuki Iriki | 1993-11-09 |
| 5230747 | Wafer having chamfered bend portions in the joint regions between the contour of the wafer and the cut-away portion of the wafer | Hisashi Maejima, Hiroshi Nishizuka, Etuo Egashira | 1993-07-27 |
| 5094539 | Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same | Takao Kawanabe, Shinya Nakagawa, Takayoshi Oosakaya, Nobuyuki Iriki | 1992-03-10 |
| 5025284 | Exposure method and exposure apparatus | Hiroshi Nishizuka, Shinya Nakagawa, Hisashi Maejima | 1991-06-18 |
| 4974018 | Exposure method and exposure apparatus | Hiroshi Nishizuka, Shinya Nakagawa, Hisashi Maejima | 1990-11-27 |
| 4783225 | Wafer and method of working the same | Hisashi Maejima, Hiroshi Nishizuka, Etuo Egashira | 1988-11-08 |
| 4699505 | Exposure method and exposure apparatus | Hiroshi Nishizuka, Shinya Nakagawa, Hisashi Maejima | 1987-10-13 |
| 4298273 | Projection aligner and method of positioning a wafer | Hiroshi Nishizuka, Koyo Morita, Takayoshi Osakaya | 1981-11-03 |
| 4218136 | Method of and apparatus for aligning photomask | Koyo Morita, Hiroshi Nishizuka, Hisashi Maejima | 1980-08-19 |