| D697299 |
Shoe upper |
— |
2014-01-14 |
| D659986 |
Shoe upper |
— |
2012-05-22 |
| D623841 |
Shoe upper |
— |
2010-09-21 |
| D574590 |
Shoe upper |
— |
2008-08-12 |
| RE40139 |
Wafer having chamfered bend portions in the joint regions between the contour of the cut-away portion of the wafer |
Hiroshi Nishizuka, Susumu Komoriya, Etuo Egashira |
2008-03-04 |
| 6174222 |
Process for fabrication of semiconductor device, semiconductor wafer for use in the process and process for the preparation of the wafer |
Tomomi Sato, Norio Suzuki, Hirofumi Shimizu, Atsuyoshi Koike, Akira Kanai |
2001-01-16 |
| 5497331 |
Semiconductor integrated circuit device fabrication method and its fabrication apparatus |
Nobuyuki Iriki, Tsutomu Okabe, Kenji Watanabe, Shinji Kuniyoshi |
1996-03-05 |
| 5279992 |
Method of producing a wafer having a curved notch |
Hiroshi Nishizuka, Susumu Komoriya, Etuo Egashira |
1994-01-18 |
| 5230747 |
Wafer having chamfered bend portions in the joint regions between the contour of the wafer and the cut-away portion of the wafer |
Hiroshi Nishizuka, Susumu Komoriya, Etuo Egashira |
1993-07-27 |
| 5025284 |
Exposure method and exposure apparatus |
Susumu Komoriya, Hiroshi Nishizuka, Shinya Nakagawa |
1991-06-18 |
| 4974018 |
Exposure method and exposure apparatus |
Susumu Komoriya, Hiroshi Nishizuka, Shinya Nakagawa |
1990-11-27 |
| 4783225 |
Wafer and method of working the same |
Hiroshi Nishizuka, Susumu Komoriya, Etuo Egashira |
1988-11-08 |
| 4699505 |
Exposure method and exposure apparatus |
Susumu Komoriya, Hiroshi Nishizuka, Shinya Nakagawa |
1987-10-13 |
| 4544318 |
Manufacturing system |
Hiroto Nagatomo, Jun Suzuki, Keishin Fujikawa |
1985-10-01 |
| 4477182 |
Pattern exposing apparatus |
Akihiro Takanashi, Norikazu Hashimoto, Shuji Sugiyama |
1984-10-16 |
| 4218136 |
Method of and apparatus for aligning photomask |
Susumu Komoriya, Koyo Morita, Hiroshi Nishizuka |
1980-08-19 |
