CW

Christy Mei-Chu Woo

Globalfoundries: 1 patents #2,221 of 4,424Top 55%
SL Spansion Llc.: 1 patents #435 of 769Top 60%
📍 San Jose, CA: #283 of 32,062 inventorsTop 1%
🗺 California: #2,419 of 386,348 inventorsTop 1%
Overall (All Time): #15,852 of 4,157,543Top 1%
96
Patents All Time

Issued Patents All Time

Showing 76–96 of 96 patents

Patent #TitleCo-InventorsDate
6387806 Filling an interconnect opening with different types of alloys to enhance interconnect reliability Pin-Chin Connie Wang 2002-05-14
6383880 NH3/N2-plasma treatment for reduced nickel silicide bridging Minh Van Ngo, Robert A. Huertas 2002-05-07
6372673 Silicon-starved nitride spacer deposition Paul R. Besser, Minh Van Ngo, George Jonathan Kluth 2002-04-16
6362095 Nickel silicide stripping after nickel silicide formation George Jonathan Kluth, Jacques Bertrand 2002-03-26
6358840 Forming and filling a recess in interconnect with alloy to minimize electromigration Pin-Chin Connie Wang 2002-03-19
6346479 Method of manufacturing a semiconductor device having copper interconnects Pin-Chin Connie Wang 2002-02-12
6332989 Slurry for chemical mechanical polishing of copper Kai Yang, Steven C. Avanzino 2001-12-25
6270635 Consistent plating system for electroplating 2001-08-07
6228759 Method of forming an alloy precipitate to surround interconnect to minimize electromigration Pin-Chin Connie Wang, Sergey Lopatin 2001-05-08
6228768 Storage-annealing plated CU interconnects Young-Chang Joo 2001-05-08
6143656 Slurry for chemical mechanical polishing of copper Kai Yang, Steven C. Avanzino 2000-11-07
6121141 Method of forming a void free copper interconnects Dirk Brown, Young-Chang Joo, Imran Hashim 2000-09-19
6117770 Method for implanting semiconductor conductive layers Shekhar Pramanick, Dirk Brown, John A. Iacoponi 2000-09-12
6103085 Electroplating uniformity by diffuser design John A. Iacoponi, Kai Yang 2000-08-15
6103086 Method of forming reliable copper interconnects with improved hole filling Axel Preusse, Sergey Lopatin 2000-08-15
6096648 Copper/low dielectric interconnect formation with reduced electromigration Sergey Lopatin, Takeshi Nogami, Robin Cheung, Guarionex Morales 2000-08-01
6017463 Point of use mixing for LI/plug tungsten polishing slurry to improve existing slurry Steven C. Avanzino, Steven Douglas Bartlett 2000-01-25
5916855 Chemical-mechanical polishing slurry formulation and method for tungsten and titanium thin films Steven C. Avanzino, Diana M. Schonauer, Peter A. Burke 1999-06-29
5816891 Performing chemical mechanical polishing of oxides and metals using sequential removal on multiple polish platens to increase equipment throughput 1998-10-06
5801095 Production worthy interconnect process for deep sub-half micrometer back-end-of-line technology Richard J. Huang 1998-09-01
5686761 Production worthy interconnect process for deep sub-half micrometer back-end-of-line technology Richard J. Huang 1997-11-11