Issued Patents All Time
Showing 51–75 of 132 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7762798 | Compressor having different hardness surface between upper surface and receiving surface of top dead center of compression member and vane | Hirotsugu Ogasawara, Takahiro Nishikawa | 2010-07-27 |
| 7670756 | Pattern forming method, semiconductor device manufacturing method and exposure mask set | Takeo Ishibashi, Maya Itoh, Shuji Nakao | 2010-03-02 |
| 7651329 | Exhaust gas processing device, and method of using the same | Hajime Okura, Toshio Katsube | 2010-01-26 |
| 7638030 | Electrolytic processing apparatus and electrolytic processing method | Osamu Nabeya, Masayuki Kumekawa, Hozumi Yasuda, Itsuki Kobata, Takeshi Iizumi +7 more | 2009-12-29 |
| 7578886 | Substrate processing apparatus, substrate processing method, and substrate holding apparatus | Kaoru Yamada, Sumio Yabe, Kenya Ito, Masayuki Kamezawa, Masaya Seki +2 more | 2009-08-25 |
| 7563356 | Composite processing apparatus and method | Osamu Nabeya, Tsukuru Suzuki, Yasushi Toma, Ikutaro Noji | 2009-07-21 |
| 7538890 | Wavefront-measuring interferometer apparatus, and light beam measurement apparatus and method thereof | Zongtao Ge, Minoru Kurose | 2009-05-26 |
| 7527723 | Electrolytic processing apparatus and electrolytic processing method | Itsuki Kobata, Yutaka Wada, Hirokuni Hiyama, Yasushi Toma, Tsukuru Suzuki +1 more | 2009-05-05 |
| 7476290 | Substrate processing apparatus and substrate processing method | Tsukuru Suzuki, Kaoru Yamada, Kenya Ito, Masayuki Kamezawa, Kenji Yamaguchi | 2009-01-13 |
| 7459265 | Pattern forming method, semiconductor device manufacturing method and exposure mask set | Takeo Ishibashi, Maya Itoh, Shuji Nakao | 2008-12-02 |
| 7427345 | Method and device for regenerating ion exchanger, and electrolytic processing apparatus | Tsukuru Suzuki, Yuji Makita, Kaoru Yamada, Masayuki Kumekawa, Hozumi Yasuda +5 more | 2008-09-23 |
| 7255778 | Electrochemical machining method and apparatus | Yuzo Mori, Mitsuhiko Shirakashi, Yasushi Toma, Itsuki Kobata | 2007-08-14 |
| 7208076 | Substrate processing apparatus and method | Itsuki Kobata, Mitsuhiko Shirakashi, Masayuki Kumekawa, Yasushi Toma, Tsukuru Suzuki +3 more | 2007-04-24 |
| 7101465 | Electrolytic processing device and substrate processing apparatus | Itsuki Kobata, Mitsuhiko Shirakashi, Masayuki Kumekawa, Yasushi Toma, Tsukuru Suzuki +3 more | 2006-09-05 |
| 7092104 | Speckle interferometer apparatus | Masatoshi Hizuka, Hideo Kanda | 2006-08-15 |
| 6932884 | Substrate processing apparatus | Tsukuru Suzuki, Yuji Makita, Kaoru Yamada, Mitsuhiko Shirakashi, Kenya Ito | 2005-08-23 |
| 6921063 | Gas dissolved water producing apparatus and method thereof and ultrasonic cleaning equipment and method thereof | Suguru OZAWA, Ryoichi Shinjo, Minoru Harada, Kenichi Sasaki, Keiichi MURAKAWA +1 more | 2005-07-26 |
| 6875335 | Electrolytic machining method and apparatus | Yuzo Mori, Mitsuhiko Shirakashi, Yasushi Toma, Akira Fukunaga, Itsuki Kobata | 2005-04-05 |
| 6787454 | Method of manufacturing semiconductor device having dual damascene structure | — | 2004-09-07 |
| 6743349 | Electrochemical machining method and apparatus | Yuzo Mori, Mitsuhiko Shirakashi, Yasushi Toma, Itsuki Kobata | 2004-06-01 |
| 6686751 | Method and apparatus for detecting negative ion in water | Syu Nakanishi, Kanroku Chounan | 2004-02-03 |
| 6643681 | System for constructing network community | Tatsuji Igarashi | 2003-11-04 |
| 6602396 | Electrolytic machining method and apparatus | Yuzo Mori, Mitsuhiko Shirakashi, Yasushi Toma, Akira Fukunaga, Itsuki Kobata | 2003-08-05 |
| 6514122 | System for manufacturing semiconductor device utilizing photolithography technique | Tadashi Miyagi, Takuya Matsushita | 2003-02-04 |
| 6509251 | Method of forming a resist pattern for blocking implantation of an impurity into a semiconductor substrate | Sachiko Hattori | 2003-01-21 |