Issued Patents All Time
Showing 25 most recent of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12381089 | Information processing system, information processing method, program, and substrate processing apparatus | Keisuke Namiki, Makoto Fukushima | 2025-08-05 |
| 12358096 | Rubber membrane having first and second hardness for use in a polishing head | Shingo Togashi | 2025-07-15 |
| 12337438 | Break-in processing apparatus and break-in processing method | Kenichi Akazawa | 2025-06-24 |
| 12230529 | Substrate holding apparatus, substrate suction determination method, substrate polishing apparatus, substrate polishing method, method of removing liquid from upper surface of wafer to be polished, elastic film for pressing wafer against polishing pad, substrate release method, and constant amount gas supply apparatus | Satoru Yamaki, Makoto Fukushima | 2025-02-18 |
| 12183642 | Film-thickness measuring method, method of detecting notch portion, and polishing apparatus | Shingo Togashi, Keisuke Namiki | 2024-12-31 |
| 12128523 | Polishing apparatus | Makoto Fukushima, Hozumi Yasuda, Keisuke Namiki, Shingo Togashi, Satoru Yamaki | 2024-10-29 |
| 12068189 | Elastic membrane, substrate holding device, and polishing apparatus | Satoru Yamaki, Makoto Fukushima, Keisuke Namiki, Shingo Togashi, Tomoko Owada +1 more | 2024-08-20 |
| 11958163 | Substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membrane | Makoto Fukushima, Keisuke Namiki, Shingo Togashi, Satoru Yamaki, Masahiko Kishimoto +1 more | 2024-04-16 |
| D1021832 | Elastic membrane | Kenichi Akazawa, Shingo Togashi, Satoru Yamaki, Tomoko Owada, Cheng Cheng +1 more | 2024-04-09 |
| 11752590 | Polishing head and polishing apparatus | Yuichi Kato | 2023-09-12 |
| 11745306 | Polishing apparatus and method of controlling inclination of stationary ring | Tomoko Owada, Makoto Fukushima, Keisuke Namiki, Shingo Togashi, Satoru Yamaki +1 more | 2023-09-05 |
| 11731235 | Polishing apparatus and polishing method | Shingo Togashi, Makoto Fukushima, Keisuke Namiki, Satoru Yamaki, Tomoko Owada +1 more | 2023-08-22 |
| D989012 | Elastic membrane | Kenichi Akazawa, Shingo Togashi, Satoru Yamaki, Tomoko Owada, Cheng Cheng +1 more | 2023-06-13 |
| 11654524 | Method of detecting abnormality of a roller which transmits a local load to a retainer ring, and polishing apparatus | Tomoko Owada, Yuta Suzuki, Shingo Togashi | 2023-05-23 |
| D981969 | Elastic membrane for semiconductor wafer polishing apparatus | Kenichi Akazawa, Tomoko Owada, Makoto Fukushima, Yuichi Kato | 2023-03-28 |
| D981459 | Retaining ring for substrate | Kenichi Akazawa | 2023-03-21 |
| 11478895 | Substrate holding device, substrate polishing apparatus, and method of manufacturing the substrate holding device | Shingo Togashi, Hozumi Yasuda, Makoto Fukushima | 2022-10-25 |
| 11472000 | Substrate adsorption method, substrate holding apparatus, substrate polishing apparatus, elastic film, substrate adsorption determination method for substrate holding apparatus, and pressure control method for substrate holding apparatus | Hiroyuki Shinozaki, Makoto Fukushima | 2022-10-18 |
| 11426834 | Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method | Mitsuru Miyazaki, Seiji Katsuoka, Naoki Matsuda, Junji Kunisawa, Kenichi Kobayashi +5 more | 2022-08-30 |
| 11224956 | Polishing apparatus | Tetsuji Togawa, Makoto Fukushima, Hozumi Yasuda | 2022-01-18 |
| 11179823 | Substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membrane | Makoto Fukushima, Keisuke Namiki, Shingo Togashi, Satoru Yamaki, Masahiko Kishimoto +1 more | 2021-11-23 |
| 11088011 | Elastic membrane, substrate holding device, and polishing apparatus | Satoru Yamaki, Makoto Fukushima, Keisuke Namiki, Shingo Togashi, Tomoko Owada +1 more | 2021-08-10 |
| 11059144 | Polishing apparatus | — | 2021-07-13 |
| D918161 | Elastic membrane | Shingo Togashi, Makoto Fukushima, Keisuke Namiki, Satoru Yamaki, Tomoko Owada +1 more | 2021-05-04 |
| 10991613 | Substrate holding apparatus, substrate suction determination method, substrate polishing apparatus, substrate polishing method, method of removing liquid from upper surface of wafer to be polished, elastic film for pressing wafer against polishing pad, substrate release method, and constant amount gas supply apparatus | Satoru Yamaki, Makoto Fukushima | 2021-04-27 |