Issued Patents All Time
Showing 1–25 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12230529 | Substrate holding apparatus, substrate suction determination method, substrate polishing apparatus, substrate polishing method, method of removing liquid from upper surface of wafer to be polished, elastic film for pressing wafer against polishing pad, substrate release method, and constant amount gas supply apparatus | Osamu Nabeya, Makoto Fukushima | 2025-02-18 |
| 12128523 | Polishing apparatus | Makoto Fukushima, Hozumi Yasuda, Keisuke Namiki, Osamu Nabeya, Shingo Togashi | 2024-10-29 |
| 12068189 | Elastic membrane, substrate holding device, and polishing apparatus | Makoto Fukushima, Keisuke Namiki, Osamu Nabeya, Shingo Togashi, Tomoko Owada +1 more | 2024-08-20 |
| 11958163 | Substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membrane | Osamu Nabeya, Makoto Fukushima, Keisuke Namiki, Shingo Togashi, Masahiko Kishimoto +1 more | 2024-04-16 |
| D1021832 | Elastic membrane | Kenichi Akazawa, Osamu Nabeya, Shingo Togashi, Tomoko Owada, Cheng Cheng +1 more | 2024-04-09 |
| 11745306 | Polishing apparatus and method of controlling inclination of stationary ring | Tomoko Owada, Makoto Fukushima, Keisuke Namiki, Osamu Nabeya, Shingo Togashi +1 more | 2023-09-05 |
| 11731235 | Polishing apparatus and polishing method | Shingo Togashi, Makoto Fukushima, Keisuke Namiki, Osamu Nabeya, Tomoko Owada +1 more | 2023-08-22 |
| D989012 | Elastic membrane | Kenichi Akazawa, Osamu Nabeya, Shingo Togashi, Tomoko Owada, Cheng Cheng +1 more | 2023-06-13 |
| 11179823 | Substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membrane | Osamu Nabeya, Makoto Fukushima, Keisuke Namiki, Shingo Togashi, Masahiko Kishimoto +1 more | 2021-11-23 |
| 11088011 | Elastic membrane, substrate holding device, and polishing apparatus | Makoto Fukushima, Keisuke Namiki, Osamu Nabeya, Shingo Togashi, Tomoko Owada +1 more | 2021-08-10 |
| D918161 | Elastic membrane | Shingo Togashi, Makoto Fukushima, Keisuke Namiki, Osamu Nabeya, Tomoko Owada +1 more | 2021-05-04 |
| 10991613 | Substrate holding apparatus, substrate suction determination method, substrate polishing apparatus, substrate polishing method, method of removing liquid from upper surface of wafer to be polished, elastic film for pressing wafer against polishing pad, substrate release method, and constant amount gas supply apparatus | Osamu Nabeya, Makoto Fukushima | 2021-04-27 |
| D913977 | Elastic membrane for semiconductor wafer polishing | Makoto Fukushima, Keisuke Namiki, Osamu Nabeya, Shingo Togashi, Tomoko Owada +1 more | 2021-03-23 |
| 10702972 | Polishing apparatus | Makoto Fukushima, Hozumi Yasuda, Keisuke Namiki, Osamu Nabeya, Shingo Togashi | 2020-07-07 |
| 10464185 | Substrate polishing method, top ring, and substrate polishing apparatus | Shintaro ISONO, Hozumi Yasuda, Keisuke Namiki, Osamu Nabeya, Makoto Fukushima +1 more | 2019-11-05 |
| D859332 | Elastic membrane for semiconductor wafer polishing | Makoto Fukushima, Keisuke Namiki, Osamu Nabeya, Shingo Togashi, Tomoko Owada | 2019-09-10 |
| 10391603 | Polishing apparatus, control method and recording medium | Hozumi Yasuda, Keisuke Namiki, Osamu Nabeya, Makoto Fukushima, Shingo Togashi +1 more | 2019-08-27 |
| 10213896 | Elastic membrane, substrate holding apparatus, and polishing apparatus | Makoto Fukushima, Hozumi Yasuda, Keisuke Namiki, Osamu Nabeya, Shingo Togashi +1 more | 2019-02-26 |
| D839224 | Elastic membrane for semiconductor wafer polishing | Makoto Fukushima, Keisuke Namiki, Osamu Nabeya, Shingo Togashi, Tomoko Owada +1 more | 2019-01-29 |
| 9999956 | Polishing device and polishing method | Keisuke Namiki, Hozumi Yasuda, Osamu Nabeya, Makoto Fukushima, Shingo Togashi +1 more | 2018-06-19 |
| D813180 | Elastic membrane for semiconductor wafer polishing apparatus | Makoto Fukushima, Hozumi Yasuda, Keisuke Namiki, Osamu Nabeya, Shingo Togashi | 2018-03-20 |
| D808349 | Elastic membrane for semiconductor wafer polishing apparatus | Makoto Fukushima, Hozumi Yasuda, Keisuke Namiki, Osamu Nabeya, Shingo Togashi | 2018-01-23 |
| 9815171 | Substrate holder, polishing apparatus, polishing method, and retaining ring | Hozumi Yasuda, Keisuke Namiki, Osamu Nabeya, Makoto Fukushima, Shingo Togashi | 2017-11-14 |
| D799437 | Substrate retaining ring | Osamu Nabeya, Hozumi Yasuda, Makoto Fukushima, Shingo Togashi, Keisuke Namiki | 2017-10-10 |
| D794585 | Retainer ring for substrate | Osamu Nabeya, Hozumi Yasuda, Makoto Fukushima, Keisuke Namiki, Shingo Togashi | 2017-08-15 |