Issued Patents All Time
Showing 26–39 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D793976 | Substrate retaining ring | Makoto Fukushima, Hozumi Yasuda, Keisuke Namiki, Osamu Nabeya, Shingo Togashi | 2017-08-08 |
| 9662764 | Substrate holder, polishing apparatus, and polishing method | Makoto Fukushima, Hozumi Yasuda, Keisuke Namiki, Osamu Nabeya, Shingo Togashi | 2017-05-30 |
| 9573244 | Elastic membrane, substrate holding apparatus, and polishing apparatus | Makoto Fukushima, Hozumi Yasuda, Keisuke Namiki, Osamu Nabeya, Shingo Togashi +1 more | 2017-02-21 |
| D770990 | Elastic membrane for semiconductor wafer polishing apparatus | Makoto Fukushima, Hozumi Yasuda, Keisuke Namiki, Osamu Nabeya, Shingo Togashi | 2016-11-08 |
| D769200 | Elastic membrane for semiconductor wafer polishing apparatus | Makoto Fukushima, Hozumi Yasuda, Keisuke Namiki, Osamu Nabeya, Shingo Togashi | 2016-10-18 |
| D766849 | Substrate retaining ring | Makoto Fukushima, Hozumi Yasuda, Keisuke Namiki, Osamu Nabeya, Shingo Togashi | 2016-09-20 |
| 9403255 | Polishing apparatus and polishing method | Makoto Fukushima, Hozumi Yasuda, Keisuke Namiki, Osamu Nabeya, Shingo Togashi | 2016-08-02 |
| 9149903 | Polishing apparatus having substrate holding apparatus | Makoto Fukushima, Katsuhide Watanabe, Hozumi Yasuda | 2015-10-06 |
| 9073170 | Polishing apparatus having thermal energy measuring means | Makoto Fukushima, Katsuhide Watanabe, Hozumi Yasuda | 2015-07-07 |
| 8932106 | Polishing apparatus having thermal energy measuring means | Makoto Fukushima, Katsuhide Watanabe, Hozumi Yasuda | 2015-01-13 |
| 8870625 | Method and apparatus for dressing polishing pad, profile measuring method, substrate polishing apparatus, and substrate polishing method | Tetsuji Togawa, Keisuke Namiki | 2014-10-28 |
| 8859070 | Elastic membrane | Hozumi Yasuda, Katsuhide Watanabe, Keisuke Namiki, Osamu Nabeya, Makoto Fukushima +1 more | 2014-10-14 |
| D634719 | Elastic membrane for semiconductor wafer polishing apparatus | Hozumi Yasuda, Keisuke Namiki, Makoto Fukushima, Osamu Nabeya, Koji Saito +3 more | 2011-03-22 |
| D633452 | Elastic membrane for semiconductor wafer polishing apparatus | Keisuke Namiki, Hozumi Yasuda, Osamu Nabeya, Makoto Fukushima, Shingo Togashi +1 more | 2011-03-01 |