Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8679727 | Developing method for immersion lithography, solvent used for the developing method and electronic device using the developing method | Mamoru Terai, Takuya Hagiwara | 2014-03-25 |
| 8178983 | Water repellant composition for substrate to be exposed, method for forming resist pattern, electronic device produced by the formation method, treatment method for imparting water repellency to substrate to be exposed, water repellant set for substrate to be exposed, and treatment method for imparting water repellency to substrate to be exposed using the same | Mamoru Terai, Takuya Hagiwara, Osamu Yokokoji, Yoko Takebe | 2012-05-15 |
| 8092703 | Manufacturing method of semiconductor device | Kazumasa Yonekura, Masahiro Tadokoro, Kazunori Yoshikawa, Yoshiharu Ono | 2012-01-10 |
| 8017305 | Pattern forming method, semiconductor device manufacturing method and exposure mask set | Takayuki Saito, Maya Itoh, Shuji Nakao | 2011-09-13 |
| 7935636 | Method of fabricating semiconductor device | — | 2011-05-03 |
| 7727709 | Method of forming resist pattern and method of manufacturing semiconductor device | Toshifumi Suganaga, Tetsuro Hanawa | 2010-06-01 |
| 7670756 | Pattern forming method, semiconductor device manufacturing method and exposure mask set | Takayuki Saito, Maya Itoh, Shuji Nakao | 2010-03-02 |
| 7544619 | Method of fabricating semiconductor device | — | 2009-06-09 |
| 7459265 | Pattern forming method, semiconductor device manufacturing method and exposure mask set | Takayuki Saito, Maya Itoh, Shuji Nakao | 2008-12-02 |
| 7030007 | Via-filling material and process for fabricating semiconductor integrated circuit using the material | Teruhiko Kumada, Toshiyuki Toyoshima, Hideharu Nobutoki, Yoshiharu Ono, Junjiro Sakai | 2006-04-18 |
| 6815142 | Method for forming resist pattern, and overlying layer material and semiconductor device used for forming resist pattern | Yoshika Kimura | 2004-11-09 |
| 6593063 | Method of manufacturing a semiconductor device having an improved fine structure | Mikihiro Tanaka | 2003-07-15 |
| 6589880 | Fine pattern formation method and semiconductor device or liquid crystal device manufacturing method employing this method | — | 2003-07-08 |
| 6579657 | Material for forming a fine pattern and method for manufacturing a semiconductor device using the same | Toshiyuki Toyoshima, Keiichi Katayama, Ayumi Minamide | 2003-06-17 |
| 6566040 | Method of manufacturing a semiconductor device and semiconductor device manufactured by the method | Kanji Sugino, Takayuki Shoya | 2003-05-20 |
| 6376157 | Method of manufacturing a semiconductor device, chemical solution to form fine pattern, and semiconductor device | Mikihiro Tanaka | 2002-04-23 |
| 6374397 | Lot determination apparatus, lot determination method, and recording medium for storing the method | Yuki Miyamoto | 2002-04-16 |
| 6319853 | Method of manufacturing a semiconductor device using a minute resist pattern, and a semiconductor device manufactured thereby | Toshiyuki Toyoshima, Keiichi Katayama, Naoki Yasuda | 2001-11-20 |
| 6180320 | Method of manufacturing a semiconductor device having a fine pattern, and semiconductor device manufactured thereby | Takayuki Saito, Toshiyuki Toyoshima, Kanji Sugino, Naoki Yasuda, Tadashi Miyagi | 2001-01-30 |
| 6171761 | Resist pattern forming method utilizing multiple baking and partial development steps | Ayumi Minamide | 2001-01-09 |
| 6133138 | Method of manufacturing semiconductor device having multilayer interconnection structure | — | 2000-10-17 |
| 5858620 | Semiconductor device and method for manufacturing the same | Ayumi Minamide, Toshiyuki Toyoshima, Keiichi Katayama | 1999-01-12 |
| 5554489 | Method of forming a fine resist pattern using an alkaline film covered photoresist | Eiichi Ishikawa, Itaru Kanai | 1996-09-10 |
| 5451479 | Method of forming a pattern of a multilayer type semiconductor device | — | 1995-09-19 |
| 5213806 | Pharmaceutical composition comprising calcium polycarbophil | Yasuo Ito, Hideo Kato, Osamu Nagata, Masaharu Yamazaki, Masakazu Kitayama | 1993-05-25 |