Issued Patents All Time
Showing 1–25 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8017305 | Pattern forming method, semiconductor device manufacturing method and exposure mask set | Takeo Ishibashi, Takayuki Saito, Maya Itoh | 2011-09-13 |
| 7824843 | Pattern forming method, electronic device manufacturing method and electronic device | — | 2010-11-02 |
| 7670756 | Pattern forming method, semiconductor device manufacturing method and exposure mask set | Takeo Ishibashi, Takayuki Saito, Maya Itoh | 2010-03-02 |
| 7535585 | Computer program product executed in server computer connected to printer and client computer, and printer function description file editing method | Yukinori Matsumoto, Yoshinori Sugahara | 2009-05-19 |
| 7459265 | Pattern forming method, semiconductor device manufacturing method and exposure mask set | Takeo Ishibashi, Takayuki Saito, Maya Itoh | 2008-12-02 |
| 7209250 | Data processing apparatus, print-setting method, and recording medium | — | 2007-04-24 |
| 7033091 | Printing control device and image forming device | — | 2006-04-25 |
| 6994940 | Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device | — | 2006-02-07 |
| 6890692 | Method of focus monitoring and manufacturing method for an electronic device | Yuki Miyamoto, Naohisa Tamada, Shinroku Maejima | 2005-05-10 |
| 6828080 | Pattern forming method and method of fabricating device | — | 2004-12-07 |
| 6811939 | Focus monitoring method, focus monitoring system, and device fabricating method | Yuki Miyamoto, Shinroku Maejima | 2004-11-02 |
| 6797443 | Focus monitoring method, focus monitoring apparatus, and method of manufacturing semiconductor device | Yuki Miyamoto, Naohisa Tamada | 2004-09-28 |
| 6764794 | Photomask for focus monitoring | Yuki Miyamoto, Naohisa Tamada, Shinroku Maejima | 2004-07-20 |
| 6743554 | Photomask for aberration measurement, aberration measurement method unit for aberration measurement and manufacturing method for device | — | 2004-06-01 |
| 6709792 | Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask | — | 2004-03-23 |
| 6706453 | Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask | — | 2004-03-16 |
| 6605411 | Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask | — | 2003-08-12 |
| 6449386 | Patterned figure resolution verification method and semiconductor pattern forming method | — | 2002-09-10 |
| 6426789 | Aligner having shared rotation shaft | Teruaki Ishiba | 2002-07-30 |
| 6388731 | Projection aligner and exposure method using the same | — | 2002-05-14 |
| 6369906 | Image reproduction apparatus and method for controlling image reproduction apparatus | — | 2002-04-09 |
| 6329306 | Fine patterning utilizing an exposure method in photolithography | — | 2001-12-11 |
| 6243159 | Projection aligner and exposure method using the same | — | 2001-06-05 |
| 6171662 | Method of surface processing | — | 2001-01-09 |
| 6162736 | Process for fabricating a semiconductor integrated circuit utilizing an exposure method | — | 2000-12-19 |