Issued Patents All Time
Showing 26–48 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7221430 | Lithographic apparatus and device manufacturing method | Hendrikus Alphonsus Ludovicus Van Dijck, Laurentius Catrinus Jorritsma | 2007-05-22 |
| 7209213 | Lithographic apparatus and device manufacturing method | — | 2007-04-24 |
| 7180667 | Objective with fluoride crystal lenses | Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard +4 more | 2007-02-20 |
| 7170585 | Projection lens and microlithographic projection exposure apparatus | Martin Brunotte, Jurgen Hartmaier, Hubert Holderer, Winfried Kaiser, Alexander Kohl +2 more | 2007-01-30 |
| 7145720 | Objective with fluoride crystal lenses | Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard +4 more | 2006-12-05 |
| 7126765 | Objective with fluoride crystal lenses | Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard +4 more | 2006-10-24 |
| 7113260 | Projection exposure system for microlithography and method for generating microlithographic images | Karl-Heinz Schuster, Martin Schriever | 2006-09-26 |
| 7068349 | Method of and preventing focal plane anomalies in the focal plane of a projection system | Ingrid Minnaert-Janssen, Johannes Jacobus Matheus Baselmans, Frits Jurgen Van Hout, Peter Van Oorschot, Adriaan Roelof Van Zwol +3 more | 2006-06-27 |
| 6972831 | Projection exposure system for microlithography and method for generating microlithographic images | Karl-Heinz Schuster, Martin Schriever | 2005-12-06 |
| 6950174 | Projection exposure system for microlithography and method for generating microlithographic images | Karl-Heinz Schuster, Martin Schriever | 2005-09-27 |
| 6930758 | Projection exposure system for microlithography and method for generating microlithographic images | Karl-Heinz Schuster, Martin Schriever | 2005-08-16 |
| 6879379 | Projection lens and microlithographic projection exposure apparatus | Martin Brunotte, Jurgen Hartmaier, Hubert Holderer, Winfried Kaiser, Alexander Kohl +2 more | 2005-04-12 |
| 6825913 | Reticle with crystal support material and pellicle | Karl-Heinz Schuster | 2004-11-30 |
| 6788471 | Projection exposure apparatus for microlithography | Wilhelm Ulrich | 2004-09-07 |
| 6781668 | Optical arrangement | Karl-Heinz Schuster, Hubert Holderer, Rudolf Von Bünau, Jochen Becker, Stefan Xalter +1 more | 2004-08-24 |
| 6590718 | Projection exposure system having a reflective reticle | Gerd Furter, Uwe Gödecke, Henriette Müller | 2003-07-08 |
| 6583850 | Optical system | Wolfgang Hummel, Hubert Holderer, Rudolf Von Bünau, Jochen Becker, Stefan Xalter | 2003-06-24 |
| 6521877 | Optical arrangement having improved temperature distribution within an optical element | Werner Müller-Rissmann, Hubert Holderer, Rudolf Von Bünau, Jochen Becker, Stefan Xalter +1 more | 2003-02-18 |
| 6522392 | Optical systems and methods of compensating rotationally non-symmetrical image defects in an optical system | Werner Müller-Rissmann, Hubert Holderer, Rudolf Von Bünau, Jochen Becker, Stefan Xalter +1 more | 2003-02-18 |
| 6504597 | Optical arrangement | Karl-Heinz Schuster, Hubert Holderer, Rudolf Von Bünau, Jochen Becker, Stefan Xalter +1 more | 2003-01-07 |
| 6466382 | Optical arrangement | Werner Müller-Rissmann, Hubert Holderer, Rudolf Von Bünau, Jochen Becker, Stefan Xalter +1 more | 2002-10-15 |
| 6388823 | Optical system, especially a projection light facility for microlithography | Erwin Gaber, Hubert Holderer, Michael Gerhard, Erich Merz, Jochen Becker +1 more | 2002-05-14 |
| 6252712 | Optical system with polarization compensator | Gerhard Furter, Winfried Kaiser, Michael Gerhard, Karl-Heinz Schuster | 2001-06-26 |