ST

Stan Tsai

Applied Materials: 74 patents #80 of 7,310Top 2%
Globalfoundries: 4 patents #817 of 4,424Top 20%
IBM: 2 patents #32,839 of 70,183Top 50%
GU Globalfoundries U.S.: 1 patents #344 of 665Top 55%
📍 Fremont, CA: #107 of 9,298 inventorsTop 2%
🗺 California: #3,334 of 386,348 inventorsTop 1%
Overall (All Time): #22,196 of 4,157,543Top 1%
81
Patents All Time

Issued Patents All Time

Showing 26–50 of 81 patents

Patent #TitleCo-InventorsDate
7390744 Method and composition for polishing a substrate Renhe Jia, Feng Q. Liu, Liang-Yuh Chen 2008-06-24
7384534 Electrolyte with good planarization capability, high removal rate and smooth surface finish for electrochemically controlled copper CMP Lizhong Sun, Feng Q. Liu, Siew Neo, Liang-Yuh Chen 2008-06-10
7374644 Conductive polishing article for electrochemical mechanical polishing Paul D. Butterfield, Liang-Yuh Chen, Yongqi Hu, Antoine P. Manens, Rashid Mavliev +2 more 2008-05-20
7375023 Method and apparatus for chemical mechanical polishing of semiconductor substrates Liang-Yuh Chen, Lizhong Sun, Shijian Li, Feng Q. Liu, Rashid Mavliev +2 more 2008-05-20
7344431 Pad assembly for electrochemical mechanical processing Yongqi Hu, Yan Wang, Feng Q. Liu, Shou-Sung Chang, Liang-Yuh Chen 2008-03-18
7344432 Conductive pad with ion exchange membrane for electrochemical mechanical polishing Liang-Yun Chen, Yuchun Wang, Yan Wang, Alain Duboust, Daniel Carl +9 more 2008-03-18
7323416 Method and composition for polishing a substrate Feng Q. Liu, Tianbao Du, Alain Duboust, Yan Wang, Yongqi Hu +3 more 2008-01-29
7311592 Conductive polishing article for electrochemical mechanical polishing Liang-Yuh Chen, Yuchun Wang, Yan Wang, Alain Duboust, Daniel Carl +4 more 2007-12-25
7303662 Contacts for electrochemical processing Rashid Mavliev, Yongqi Hu, Paul D. Butterfield, Antoine P. Manens, Liang-Yuh Chen 2007-12-04
7285036 Pad assembly for electrochemical mechanical polishing Shou-Sung Chang, Donald Olgado, Liang-Yuh Chen, Alain Duboust, Ralph Wadensweiler 2007-10-23
7278911 Conductive polishing article for electrochemical mechanical polishing Paul D. Butterfield, Liang-Yuh Chen, Yonqi Hu, Antoine P. Manens, Rashid Mavliev +5 more 2007-10-09
7232514 Method and composition for polishing a substrate Feng Q. Liu, Yongqi Hu, Siew Neo, Yan Wang, Alain Duboust +1 more 2007-06-19
7232363 Polishing solution retainer Hanzhong Zhang, Feng Q. Liu, Rashid Mavliev, Donald Olgado, Liang-Yuh Chen 2007-06-19
7210988 Method and apparatus for reduced wear polishing pad conditioning Yan Wang, Yongqi Hu, Feng Q. Liu, Liang-Yuh Chen, Daxin Mao +4 more 2007-05-01
7207878 Conductive polishing article for electrochemical mechanical polishing Yongqi Hu, Yan Wang, Alain Duboust, Feng Q. Liu, Antoine P. Manens +5 more 2007-04-24
7160432 Method and composition for polishing a substrate Feng Q. Liu, Liang-Yuh Chen, Alain Duboust, Siew Neo, Yongqi Hu +2 more 2007-01-09
7153188 Temperature control in a chemical mechanical polishing system Steven M. Zuniga, Hung Chih Chen, Kapila Wijekoon, Fred C. Redeker, Rajeev Bajaj 2006-12-26
7137879 Conductive polishing article for electrochemical mechanical polishing Liang-Yuh Chen, Yuchun Wang, Yan Wang, Alain Duboust, Daniel Carl +4 more 2006-11-21
7137868 Pad assembly for electrochemical mechanical processing Shou-Sung Chang, Donald Olgado, Liang-Yuh Chen, Alain Duboust, Ralph Wadensweiler 2006-11-21
7128825 Method and composition for polishing a substrate Feng Q. Liu, Yongqi Hu, Siew Neo, Yan Wang, Alain Duboust +1 more 2006-10-31
7125477 Contacts for electrochemical processing Paul D. Butterfield, Liang-Yuh Chen, Yongqi Hu, Antoine P. Manens, Rashid Mavliev 2006-10-24
7104869 Barrier removal at low polish pressure Rashid Mavliev, Lizhong Sun, Feng Q. Liu, Liang-Yuh Chen, Ratson Morad 2006-09-12
7084064 Full sequence metal and barrier layer electrochemical mechanical processing Feng Q. Liu, Liang-Yuh Chen, Yongqi Hu 2006-08-01
7077725 Advanced electrolytic polish (AEP) assisted metal wafer planarization method and apparatus Lizhong Sun, Fritz Redeker 2006-07-18
7077721 Pad assembly for electrochemical mechanical processing Yongqi Hu, Yan Wang, Feng Q. Liu, Shou-Sung Chang, Liang-Yuh Chen 2006-07-18