Issued Patents All Time
Showing 26–42 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10971364 | Ultra-high modulus and etch selectivity boron carbon hardmask films | Ziqing Duan, Karthik Thimmavajjula Narasimha, Kwangduk Douglas Lee, Bok Hoen Kim | 2021-04-06 |
| 10950445 | Deposition of metal silicide layers on substrates and chamber components | Jiarui Wang, Kwangduk Douglas Lee, Milind Gadre, Xiaoquan Min, Paul Connors | 2021-03-16 |
| 10930475 | Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films | Ziqing Duan, Abdul Aziz Khaja, Zheng John Ye, Amit Kumar BANSAL | 2021-02-23 |
| 10923334 | Selective deposition of hardmask | Satya THOKACHICHU, Edward P. Hammond, IV, Viren Kalsekar, Zheng John Ye, Sarah Michelle Bobek +4 more | 2021-02-16 |
| 10734232 | Deposition of metal silicide layers on substrates and chamber components | Jiarui Wang, Kwangduk Douglas Lee, Milind Gadre, Xiaoquan Min, Paul Connors | 2020-08-04 |
| 10679830 | Cleaning process for removing boron-carbon residuals in processing chamber at high temperature | Feng Bi, Kwangduk Douglas Lee, Paul Connors | 2020-06-09 |
| 10636684 | Loadlock integrated bevel etcher system | Saptarshi Basu, Jeongmin Lee, Paul Connors, Dale R. Du Bois, Karthik Thimmavajjula Narasimha +12 more | 2020-04-28 |
| 10504727 | Thick tungsten hardmask films deposition on high compressive/tensile bow wafers | Jiarui Wang, Eswaranand Venkatasubramanian, Susmit Singha Roy, Kwangduk Douglas Lee | 2019-12-10 |
| 10418243 | Ultra-high modulus and etch selectivity boron-carbon hardmask films | Ziqing Duan, Karthik Thimmavajjula Narasimha, Kwangduk Douglas Lee, Bok Hoen Kim | 2019-09-17 |
| 10403515 | Loadlock integrated bevel etcher system | Saptarshi Basu, Jeongmin Lee, Paul Connors, Dale R. Du Bois, Karthik Thimmavajjula Narasimha +12 more | 2019-09-03 |
| 10403535 | Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system | Zheng John Ye, Jay D. Pinson, II, Hiroji Hanawa, Jianhua Zhou, Xing Lin +11 more | 2019-09-03 |
| 10373822 | Gas flow profile modulated control of overlay in plasma CVD films | Sudha Rathi, Praket P. Jha, Saptarshi Basu, Kwangduk Douglas Lee, Martin Jay Seamons +5 more | 2019-08-06 |
| 10325800 | High temperature electrostatic chucking with dielectric constant engineered in-situ charge trap materials | Kwangduk Douglas Lee, Bok Hoen Kim, Zheng John Ye, Swayambhu Prasad Behera, Ganesh Balasubramanian +2 more | 2019-06-18 |
| 10128088 | Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films | Ziqing Duan, Abdul Aziz Khaja, Zheng John Ye, Amit Kumar BANSAL | 2018-11-13 |
| 9837265 | Gas flow profile modulated control of overlay in plasma CVD films | Sudha Rathi, Praket P. Jha, Saptarshi Basu, Kwangduk Douglas Lee, Martin Jay Seamons +5 more | 2017-12-05 |
| 9711360 | Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in PECVD system | Ziqing Duan, Kwangduk Douglas Lee, Abdul Aziz Khaja, Amit Kumar BANSAL, Bok Hoen Kim | 2017-07-18 |
| 9390910 | Gas flow profile modulated control of overlay in plasma CVD films | Sudha Rathi, Praket P. Jha, Saptarshi Basu, Kwangduk Douglas Lee, Martin Jay Seamons +5 more | 2016-07-12 |