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Doyle E. Bennett — 39 Patents

Applied Materials: 39 patents #240 of 7,310Top 4%

Santa Clara, CA: #327 of 9,301 inventorsTop 4%

California: #11,915 of 386,348 inventorsTop 4%

Overall (All Time): #81,245 of 4,157,543Top 2%

39 Patents All Time

Doyle E. Bennett has been granted 39 US patents while listed as an inventor at Applied Materials. The first was granted in 1999 and the most recent in October 2025. Doyle E. Bennett ranks #81,245 of 4,157,543 US inventors in our database (top 2.0%). Patent records list Doyle E. Bennett in Santa Clara, CA, US.

Patents per Year

Issued Patents All Time

Showing 26–39 of 39 patents

Patent #	Title	Co-Inventors	Date	Approx Value ⓘ
7255637	Carrier head vibration damping	Andrew J. Nagengast, Hung Chih Chen	2007-08-14	$16,337,000
7247080	Feedback controlled polishing processes	Boguslaw A. Swedek, Arulkumar Shanmugasundram	2007-07-24	$43,233,000
7074109	Chemical mechanical polishing control system and method	Jeffrey Drue David, Manoocher Birang, Jimin Zhang, Boguslaw A. Swedek	2006-07-11	$12,872,000
7024268	Feedback controlled polishing processes	Boguslaw A. Swedek, Arulkumar Shanmugasundram	2006-04-04	$23,180,000
6991516	Chemical mechanical polishing with multi-stage monitoring of metal clearing	Jeffrey Drue David, Dirk De Roover, Jimin Zhang, Boguslaw A. Swedek, Manoocher Birang	2006-01-31	$13,979,000
6945845	Chemical mechanical polishing apparatus with non-conductive elements	Sandeep Rammohan Koppikar, Jeffrey Drue David, Boguslaw A. Swedek, Nils Johansson	2005-09-20	$22,251,000
6645061	Polishing pad having a grooved pattern for use in chemical mechanical polishing	Thomas H. Osterheld, Fred C. Redeker, Ginetto Addiego	2003-11-11	$43,459,000
6572453	Multi-fluid polishing process	Kapila Wijekoon, Stan Tsai, Yuchun Wang, Fred C. Redeker, Madhavi R. Chandrachood +1 more	2003-06-03	$24,892,000
6371836	Groove cleaning device for chemical-mechanical polishing	Brian J. Brown, Robert D. Tolles, James Nystrom, Madhavi R. Chandrachood	2002-04-16	$57,634,000
6273806	Polishing pad having a grooved pattern for use in a chemical mechanical polishing apparatus	Fred C. Redeker, Thomas H. Osterheld, Ginnetto Addiego	2001-08-14	$56,947,000
6251001	Substrate polishing with reduced contamination	Jay D. Pinson, II, Brian J. Brown, Thomas H. Osterheld, Benjamin A. Bonner, Nitin Shah +1 more	2001-06-26	$57,772,000
6220941	Method of post CMP defect stability improvement	Boris Fishkin, Charles C. Garretson, Peter McKeever, Thomas H. Osterheld, Gopalakrishna B. Prabhu +2 more	2001-04-24	$56,824,000
6135868	Groove cleaning device for chemical-mechanical polishing	Brian J. Brown, Robert D. Tolles, James Nystrom, Madhavi R. Chandrachood	2000-10-24	$85,890,000
5984769	Polishing pad having a grooved pattern for use in a chemical mechanical polishing apparatus	Thomas H. Osterheld, Fred C. Redeker, Ginetto Addiego	1999-11-16	$69,047,000