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Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
JN

James Nystrom — 8 Patents

Applied Materials: 6 patents #1,938 of 7,310Top 30%
HBHgst Netherlands, B.V.: 1 patents #510 of 972Top 55%
HGHGST: 1 patents #1,167 of 1,677Top 70%
Palo Alto, CA: #2,710 of 9,675 inventorsTop 30%
California: #74,834 of 386,348 inventorsTop 20%
Overall (All Time): #600,572 of 4,157,543Top 15%
8 Patents All Time
James Nystrom has been granted 8 US patents while listed as an inventor at Applied Materials. The first was granted in 1999 and the most recent in August 2013. James Nystrom ranks #600,572 of 4,157,543 US inventors in our database (top 14.4%). Patent records list James Nystrom in Palo Alto, CA, US.

Patents per Year

Patents granted per year, 1999 to 2013Bar chart with a peak of 3 patents in 1999.peak 31999: 3 patents19992000: 2 patents20002002: 1 patents20022006: 1 patents20062013: 1 patents2013

Issued Patents All Time

Showing 1–8 of 8 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
8500916 Method for aligning wafers within wafer processing equipment Jian-Huei Feng, Hung-Chin Guthrie, Quang Le 2013-08-06
7108588 System, method, and apparatus for wetting slurry delivery tubes in a chemical mechanical polishing process to prevent clogging thereof Hung-Chin Guthrie 2006-09-19 $87,000
6371836 Groove cleaning device for chemical-mechanical polishing Brian J. Brown, Robert D. Tolles, Doyle E. Bennett, Madhavi R. Chandrachood 2002-04-16 $57,634,000
6152806 Concentric platens 2000-11-28 $69,326,000
6135868 Groove cleaning device for chemical-mechanical polishing Brian J. Brown, Robert D. Tolles, Doyle E. Bennett, Madhavi R. Chandrachood 2000-10-24 $85,890,000
5989103 Magnetic carrier head for chemical mechanical polishing Manoocher Birang, John Prince 1999-11-23 $60,350,000
5938507 Linear conditioner apparatus for a chemical mechanical polishing system Sen-Hou Ko, Richard V. Rafloski, John Prince, Alfred A. Goldspiel, Stephen J. Blumenkranz +1 more 1999-08-17 $50,422,000
5899801 Method and apparatus for removing a substrate from a polishing pad in a chemical mechanical polishing system Robert D. Tolles, Jeffrey Marks, William R. Bartlett, Victor Belitsky 1999-05-04 $46,899,000