Issued Patents All Time
Showing 51–61 of 61 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6020270 | Bomine and iodine etch process for silicon and silicides | Jerry Wong, David N. Wang, Mei Chang, Dan Maydan | 2000-02-01 |
| 5883778 | Electrostatic chuck with fluid flow regulator | Semyon Sherstinsky, John F. Cameron, Shamouil Shamouilian, Manoocher Birang, Simon W. Tam +1 more | 1999-03-16 |
| 5874362 | Bromine and iodine etch process for silicon and silicides | Jerry Wong, David N. Wang, Mei Chang, Dan Maydan | 1999-02-23 |
| 5858464 | Methods and apparatus for minimizing excess aluminum accumulation in CVD chambers | Karl A. Littau, Dashun Steve Zhou, Ling Chen | 1999-01-12 |
| 5740009 | Apparatus for improving wafer and chuck edge protection | Bryan Pu, Hongching Shan, Kuang-Han Ke, Michael Welch, Semyon Sherstinsky +4 more | 1998-04-14 |
| 5673922 | Apparatus for centering substrates on support members | Semyon Sherstinsky, Leonel A. Zuniga, Ling Chen | 1997-10-07 |
| 5671117 | Electrostatic chuck | Semyon Sherstinsky, Shamouil Shamouilian, Manoocher Birang, Simon W. Tam | 1997-09-23 |
| 5634266 | Method of making a dielectric chuck | Semyon Sherstinsky, Shamouil Shamouilian, Manoocher Birang, Simon W. Tam | 1997-06-03 |
| 5509464 | Method and apparatus for cooling rectangular substrates | Norman L. Turner, John M. White | 1996-04-23 |
| 5316278 | Clamping ring apparatus for processing semiconductor wafers | Semyon Sherstinsky, Mei Chang, Charles C. Harris, James Roberts, Simon W. Tam +1 more | 1994-05-31 |
| 5201990 | Process for treating aluminum surfaces in a vacuum apparatus | Mei Chang, Ashok Sinha, Turgut Sahin, Cissy Leung | 1993-04-13 |