Issued Patents All Time
Showing 26–50 of 78 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8236592 | Method of forming semiconductor device | Ryoung-Han Kim, Thomas I. Wallow, Jongwook Kye, Alden Acheta | 2012-08-07 |
| 8067252 | Method for determining low-noise power spectral density for characterizing line edge roughness in semiconductor wafer processing | Yuansheng Ma, Thomas I. Wallow | 2011-11-29 |
| 7986146 | Method and system for detecting existence of an undesirable particle during semiconductor fabrication | Obert R. Wood, II | 2011-07-26 |
| 7985513 | Fluorine-passivated reticles for use in lithography and methods for fabricating the same | Uzodinma Okoroanyanwu, Anna Tchikoulaeva, Rene Wirtz | 2011-07-26 |
| 7851136 | Stabilization of deep ultraviolet photoresist | Ryoung-Han Kim, Thomas I. Wallow | 2010-12-14 |
| 7741012 | Method for removal of immersion lithography medium in immersion lithography processes | Adam R. Pawloski, Amr Y. Abdo, Gilles Amblard, Bruno M. LaFontaine, Ivan Lalovic +3 more | 2010-06-22 |
| 7563560 | Solution and method for manufacturing an integrated circuit | Adam R. Pawloski | 2009-07-21 |
| 7315033 | Method and apparatus for reducing biological contamination in an immersion lithography system | Adam R. Pawloski, Jongwook Kye | 2008-01-01 |
| 7199994 | Method and system for flattening a reticle within a lithography system | Thomas White | 2007-04-03 |
| 7061578 | Method and apparatus for monitoring and controlling imaging in immersion lithography systems | — | 2006-06-13 |
| 7014966 | Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems | Adam R. Pawloski, Amr Y. Abdo, Gilles Amblard, Bruno M. LaFontaine, Ivan Lalovic +3 more | 2006-03-21 |
| 7006209 | Method and apparatus for monitoring and controlling imaging in immersion lithography systems | — | 2006-02-28 |
| 6984475 | Extreme ultraviolet (EUV) lithography masks | Bruno M. LaFontaine, Ivan Lalovic, Adam R. Pawloski | 2006-01-10 |
| 6872497 | Reflective mask for short wavelength lithography | Bruno La Fontaine | 2005-03-29 |
| 6740566 | Ultra-thin resist shallow trench process using high selectivity nitride etch | Christopher F. Lyons, Scott A. Bell, Khanh B. Nguyen, Fei Wang, Chih-Yuh Yang | 2004-05-25 |
| 6716571 | Selective photoresist hardening to facilitate lateral trimming | Calvin T. Gabriel, Uzodinma Okoroanyanwu | 2004-04-06 |
| 6710853 | Phase grating focus monitor using overlay technique | Bruno La Fontaine, Jongwook Kye | 2004-03-23 |
| 6696847 | Photo assisted electrical linewidth measurement method and apparatus | Bruno M. LaFontaine, Jongwook Kye | 2004-02-24 |
| 6645679 | Attenuated phase shift mask for use in EUV lithography and a method of making such a mask | Bruno La Fontaine, Calvin T. Gabriel, Kouros Ghandehari | 2003-11-11 |
| 6627355 | Method of and system for improving stability of photomasks | Fan Piao, Christopher A. Spence | 2003-09-30 |
| 6623893 | Pellicle for use in EUV lithography and a method of making such a pellicle | Christopher F. Lyons | 2003-09-23 |
| 6608321 | Differential wavelength inspection system | Bruno La Fontaine, Jeffrey A. Schefske | 2003-08-19 |
| 6593035 | Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films | Christopher F. Lyons | 2003-07-15 |
| 6593037 | EUV mask or reticle having reduced reflections | Calvin T. Gabriel, Bruno M. LaFontaine | 2003-07-15 |
| 6556286 | Inspection system for the pupil of a lithographic tool | Bruno La Fontaine, Jongwook Kye | 2003-04-29 |