Issued Patents All Time
Showing 51–75 of 78 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6544693 | Pellicle for use in small wavelength lithography and a method for making such a pellicle | Christopher F. Lyons | 2003-04-08 |
| 6544885 | Polished hard mask process for conductor layer patterning | Khanh B. Nguyen, Christopher F. Lyons, Scott A. Bell, Fei Wang, Chih-Yuh Yang | 2003-04-08 |
| 6535280 | Phase-shift-moiré focus monitor | Bruno La Fontaine, Jongwook Kye | 2003-03-18 |
| 6515272 | Method and apparatus for improving signal to noise ratio of an aerial image monitor | Bruno Fontaine | 2003-02-04 |
| 6440640 | Thin resist with transition metal hard mask for via etch application | Chih-Yuh Yang, Christopher F. Lyons, Khanh B. Nguyen, Fei Wang, Scott A. Bell | 2002-08-27 |
| 6399401 | Test structures for electrical linewidth measurement and processes for their formation | Jongwook Kye | 2002-06-04 |
| 6309926 | Thin resist with nitride hard mask for gate etch application | Scott A. Bell, Christopher F. Lyons, Khanh B. Nguyen, Fei Wang, Chih-Yuh Yang | 2001-10-30 |
| 6306560 | Ultra-thin resist and SiON/oxide hard mask for metal etch | Fei Wang, Christopher F. Lyons, Khanh B. Nguyen, Scott A. Bell, Chih-Yuh Yang | 2001-10-23 |
| 6251545 | Method and system for improving transmission of light through photomasks | — | 2001-06-26 |
| 6208747 | Determination of scanning error in scanner by reticle rotation | Khanh B. Nguyen | 2001-03-27 |
| 6207966 | Mark protection with transparent film | Khanh B. Nguyen, Richard D. Edwards, Stuart E. Brown, Paul Ackmann | 2001-03-27 |
| 6200907 | Ultra-thin resist and barrier metal/oxide hard mask for metal etch | Fei Wang, Christopher F. Lyons, Khanh B. Nguyen, Scott A. Bell, Chih-Yuh Yang | 2001-03-13 |
| 6184128 | Method using a thin resist mask for dual damascene stop layer etch | Fei Wang, Christopher F. Lyons, Khanh B. Nguyen, Scott A. Bell, Chih-Yuh Yang | 2001-02-06 |
| 6178221 | Lithography reflective mask | Khanh B. Nguyen | 2001-01-23 |
| 6171763 | Ultra-thin resist and oxide/nitride hard mask for metal etch | Fei Wang, Christopher F. Lyons, Khanh B. Nguyen, Scott A. Bell, Chih-Yuh Yang | 2001-01-09 |
| 6165695 | Thin resist with amorphous silicon hard mask for via etch application | Chih-Yuh Yang, Christopher F. Lyons, Khanh B. Nguyen, Fei Wang, Scott A. Bell | 2000-12-26 |
| 6162587 | Thin resist with transition metal hard mask for via etch application | Chih-Yuh Yang, Christopher F. Lyons, Khanh B. Nguyen, Fei Wang, Scott A. Bell | 2000-12-19 |
| 6159643 | Extreme ultraviolet lithography reflective mask | Khanh B. Nguyen | 2000-12-12 |
| 6156658 | Ultra-thin resist and silicon/oxide hard mask for metal etch | Fei Wang, Christopher F. Lyons, Khanh B. Nguyen, Scott A. Bell, Chih-Yuh Yang | 2000-12-05 |
| 6140023 | Method for transferring patterns created by lithography | Scott A. Bell, Christopher F. Lyons, Khanh B. Nguyen, Fei Wang, Chih-Yuh Yang | 2000-10-31 |
| 6127070 | Thin resist with nitride hard mask for via etch application | Chih-Yuh Yang, Christopher F. Lyons, Khanh B. Nguyen, Fei Wang, Scott A. Bell | 2000-10-03 |
| 6098408 | System for controlling reflection reticle temperature in microlithography | Khanh B. Nguyen | 2000-08-08 |
| 6057206 | Mark protection scheme with no masking | Khanh B. Nguyen, Marina V. Plat, Christopher F. Lyons | 2000-05-02 |
| 6020269 | Ultra-thin resist and nitride/oxide hard mask for metal etch | Fei Wang, Christopher F. Lyons, Khanh B. Nguyen, Scott A. Bell, Chih-Yuh Yang | 2000-02-01 |
| 5985498 | Method of characterizing linewidth errors in a scanning lithography system | Khanh B. Nguyen, Anna M. Minvielle | 1999-11-16 |