Patent Leaderboard
USPTO Patent Rankings Data through Sept 30, 2025
HF

H. Jim Fulford

AMAMD: 260 patents #3 of 9,279Top 1%
TLTokyo Electron Limited: 95 patents #9 of 5,567Top 1%
Micron: 2 patents #3,728 of 6,345Top 60%
Marianna, FL: #1 of 21 inventorsTop 5%
Florida: #10 of 67,251 inventorsTop 1%
Overall (All Time): #830 of 4,157,543Top 1%
359 Patents All Time

Issued Patents All Time

Showing 226–250 of 359 patents

Patent #TitleCo-InventorsDate
6057584 Semiconductor device having a tri-layer gate insulating dielectric Mark I. Gardner, Mark C. Gilmer, Jack Lee 2000-05-02
6057583 Transistor with low resistance metal source and drain vertically displaced from the channel Mark I. Gardner 2000-05-02
6057194 Method of forming trench transistor in combination with trench array Mark I. Gardner, Derick J. Wristers 2000-05-02
6051510 Method of using a hard mask to grow dielectrics with varying characteristics James F. Buller 2000-04-18
6051487 Semiconductor device fabrication using a sacrificial plug for defining a region for a gate electrode Mark I. Gardner, Mark C. Gilmer, Robert Paiz 2000-04-18
6051471 Method for making asymmetrical N-channel and symmetrical P-channel devices Mark I. Gardner, Derick J. Wristers 2000-04-18
6049134 Mask generation technique for producing an integrated circuit with optimal metal interconnect layout for achieving global planarization Mark W. Michael, Robert Dawson, Fred N. Hause, Basab Bandyopadhyay, William S. Brennan 2000-04-11
6048785 Semiconductor fabrication method of combining a plurality of fields defined by a reticle image using segment stitching Robert Dawson, Mark I. Gardner, Frederick N. Hause, Mark W. Michael, Bradley T. Moore +1 more 2000-04-11
6040607 Self aligned method for differential oxidation rate at shallow trench isolation edge Derick J. Wristers, Mark I. Gardner 2000-03-21
6037224 Method for growing dual oxide thickness using nitrided oxides for oxidation suppression James F. Buller 2000-03-14
6031289 Integrated circuit which uses a recessed local conductor for producing staggered interconnect lines Basab Bandyopadhyay, Robert Dawson, Fred N. Hause, Mark W. Michael, William S. Brennan 2000-02-29
6030752 Method of stitching segments defined by adjacent image patterns during the manufacture of a semiconductor device Robert Dawson, Mark I. Gardner, Frederick N. Hause, Mark W. Michael, Bradley T. Moore +1 more 2000-02-29
6020232 Process of fabricating transistors having source and drain regions laterally displaced from the transistors gate Mark I. Gardner 2000-02-01
6018180 Transistor formation with LI overetch immunity Jon D. Cheek, Derick J. Wristers 2000-01-25
6017802 Ultra-short transistor fabrication scheme for enhanced reliability Mark I. Gardner 2000-01-25
6015739 Method of making gate dielectric for sub-half micron MOS transistors including a graded dielectric constant Mark I. Gardner, Dim-Lee Kwong 2000-01-18
6013546 Semiconductor device having a PMOS device with a source/drain region formed using a heavy atom p-type implant and method of manufacture thereof Mark I. Gardner, Jack Lee 2000-01-11
6011290 Short channel length MOSFET transistor Mark I. Gardner 2000-01-04
6008109 Trench isolation structure having a low K dielectric encapsulated by oxide Mark I. Gardner, Charles E. May 1999-12-28
6008095 Process for formation of isolation trenches with high-K gate dielectrics Mark I. Gardner, Charles E. May 1999-12-28
6005285 Argon doped epitaxial layers for inhibiting punchthrough within a semiconductor device Mark I. Gardner, Charles E. May 1999-12-21
5998288 Ultra thin spacers formed laterally adjacent a gate conductor recessed below the upper surface of a substrate Mark I. Gardner 1999-12-07
5998293 Multilevel interconnect structure of an integrated circuit having air gaps and pillars separating levels of interconnect Robert Dawson, Mark W. Michael, William S. Brennan, Basab Bandyopadhyay, Fred N. Hause 1999-12-07
5994175 High performance MOSFET with low resistance design Mark I. Gardner, Derick J. Wristers 1999-11-30
5981368 Enhanced shallow junction design by polysilicon line width reduction using oxidation with integrated spacer formation Mark I. Gardner, Charles E. May 1999-11-09