Issued Patents All Time
Showing 51–75 of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7705382 | Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material | Peter C. Van Buskirk, Steven M. Bilodeau, Michael W. Russell, Stephen T. Johnston, Daniel J. Vestyck +1 more | 2010-04-27 |
| 7638074 | Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films | Chongying Xu, Tianniu Chen, Thomas M. Cameron, Thomas H. Baum | 2009-12-29 |
| 7601860 | Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films | Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Tianniu Chen, Thomas H. Baum | 2009-10-13 |
| 7531679 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Ravi Laxman, Thomas H. Baum, Bryan C. Hendrix | 2009-05-12 |
| 7485611 | Supercritical fluid-based cleaning compositions and methods | Thomas H. Baum, Matthew Healy, Chongying Xu | 2009-02-03 |
| 7475588 | Apparatus and process for sensing fluoro species in semiconductor processing systems | Frank Dimeo, Jr., Philip S. H. Chen, Jeffrey W. Neuner, James Welch, Michele Stawacz +3 more | 2009-01-13 |
| 7446217 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Chongying Xu, Thomas H. Baum, Bryan C. Hendrix | 2008-11-04 |
| 7361603 | Passivative chemical mechanical polishing composition for copper film planarization | Jun Liu, Mackenzie King, Michael S. Darsillo, Karl E. Boggs, Thomas H. Baum | 2008-04-22 |
| 7344589 | Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material | Peter C. Van Buskirk, Steven M. Bilodeau, Michael W. Russell, Stephen T. Johnston, Daniel J. Vestyck +1 more | 2008-03-18 |
| 7296460 | Apparatus and process for sensing fluoro species in semiconductor processing systems | Frank Dimeo, Jr., Philip S. H. Chen, Jeffrey W. Neuner, James Welch, Michele Stawasz +3 more | 2007-11-20 |
| 7285308 | Chemical vapor deposition of high conductivity, adherent thin films of ruthenium | Bryan C. Hendrix, James Welch, Steven M. Bilodeau, Chongying Xu, Thomas H. Baum | 2007-10-23 |
| 7228724 | Apparatus and process for sensing target gas species in semiconductor processing systems | Philip S. H. Chen, Ing-Shin Chen, Frank Dimeo, Jr., Jeffrey W. Neuner, James Welch | 2007-06-12 |
| 7208427 | Precursor compositions and processes for MOCVD of barrier materials in semiconductor manufacturing | Chongying Xu, Bryan C. Hendrix, Thomas H. Baum | 2007-04-24 |
| 7094284 | Source reagent compositions for CVD formation of high dielectric constant and ferroelectric metal oxide thin films and method of using same | Thomas H. Baum, Chongying Xu, Bryan C. Hendrix | 2006-08-22 |
| 7080545 | Apparatus and process for sensing fluoro species in semiconductor processing systems | Frank Dimeo, Jr., Philip S. H. Chen, Jeffrey W. Neuner, James Welch, Michele Stawasz +3 more | 2006-07-25 |
| 7022864 | Ethyleneoxide-silane and bridged silane precursors for forming low k films | Alexander Borovik, Chongying Xu, Thomas H. Baum, Steven M. Bilodeau, Abigail Ebbing +1 more | 2006-04-04 |
| 7005303 | Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices | Frank Hintermaier, Christine Dehm, Wolfgang Hoenlein, Peter C. Van Buskirk, Bryan C. Hendrix +2 more | 2006-02-28 |
| 7005392 | Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same | Thomas H. Baum, Chongying Xu, Bryan C. Hendrix | 2006-02-28 |
| 6984417 | Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material | Peter C. Van Buskirk, Steven M. Bilodeau, Michael W. Russell, Stephen T. Johnston, Daniel J. Vestyck +1 more | 2006-01-10 |
| 6900498 | Barrier structures for integration of high K oxides with Cu and Al electrodes | Gregory T. Stauf, Bryan C. Hendrix, Ing-Shin Chen | 2005-05-31 |
| 6869638 | Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same | Thomas H. Baum, Chongying Xu, Bryan C. Hendrix | 2005-03-22 |
| 6730523 | Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices | Frank Hintermaier, Christine Dehm, Wolfgang Hoenlein, Peter C. Van Buskirk, Bryan C. Hendrix +2 more | 2004-05-04 |
| 6713797 | Textured Bi-based oxide ceramic films | Debra A. Desrochers, Bryan C. Hendrix, Frank Hintermaier | 2004-03-30 |
| 6692569 | A-SITE-AND/OR B-SITE-MODIFIED PBZRTIO3 MATERIALS AND (PB, SR, CA, BA, MG) (ZR, TI,NB, TA)O3 FILMS HAVING UTILITY IN FERROELECTRIC RANDOM ACCESS MEMORIES AND HIGH PERFORMANCE THIN FILM MICROACTUATORS | Ing-Shin Chen, Steven M. Bilodeau, Thomas H. Baum | 2004-02-17 |
| 6660331 | MOCVD of SBT using toluene-based solvent system for precursor delivery | Bryan C. Hendrix, Thomas H. Baum, Debra Desrochers Christos | 2003-12-09 |