Issued Patents All Time
Showing 26–50 of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8679894 | Low temperature deposition of phase change memory materials | Thomas H. Baum, Bryan C. Hendrix, Gregory T. Stauf, Chongying Xu, William Hunks +2 more | 2014-03-25 |
| 8524931 | Precursor compositions for ALD/CVD of group II ruthenate thin films | Chongying Xu, Bryan C. Hendrix, Thomas M. Cameron, Matthias Stender, Tianniu Chen | 2013-09-03 |
| 8330136 | High concentration nitrogen-containing germanium telluride based memory devices and processes of making | Jun Zheng, Weimin Li, Philip S. H. Chen | 2012-12-11 |
| 8288198 | Low temperature deposition of phase change memory materials | Thomas H. Baum, Bryan C. Hendrix, Gregory T. Stauf, Chongying Xu, William Hunks +2 more | 2012-10-16 |
| 8268665 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Chongying Xu, Thomas H. Baum, Matthias Stender +3 more | 2012-09-18 |
| 8241704 | Chemical vapor deposition of high conductivity, adherent thin films of ruthenium | Bryan C. Hendrix, James Welch, Steven M. Bilodeau, Chongying Xu, Thomas H. Baum | 2012-08-14 |
| 8236097 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Chongying Xu, Thomas H. Baum, Bryan C. Hendrix | 2012-08-07 |
| 8236695 | Method of passivating chemical mechanical polishing compositions for copper film planarization processes | Jun Liu, Mackenzie King, Michael S. Darsillo, Karl E. Boggs, Peter Wrschka +1 more | 2012-08-07 |
| 8206784 | Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films | Chongying Xu, Tianniu Chen, Thomas M. Cameron, Thomas H. Baum | 2012-06-26 |
| 8153833 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Ravi Laxman, Thomas H. Baum, Bryan C. Hendrix | 2012-04-10 |
| 8109130 | Apparatus and process for sensing fluoro species in semiconductor processing systems | Frank Dimeo, Jr., Philip S. H. Chen, Jeffrey W. Neuner, James Welch, Michele Stawasz +3 more | 2012-02-07 |
| 8093140 | Amorphous Ge/Te deposition process | Philip S. H. Chen, William Hunks, Tianniu Chen, Matthias Stender, Chongying Xu +1 more | 2012-01-10 |
| 8053375 | Super-dry reagent compositions for formation of ultra low k films | Chongying Xu, Thomas H. Baum, Steven M. Bilodeau, Scott L. Battle, William Hunks +1 more | 2011-11-08 |
| 8034407 | Chemical vapor deposition of high conductivity, adherent thin films of ruthenium | Bryan C. Hendrix, James Welch, Steven M. Bilodeau, Chongying Xu, Thomas H. Baum | 2011-10-11 |
| 8008117 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Chongying Xu, Thomas H. Baum, Melissa A. Petruska +4 more | 2011-08-30 |
| 7964746 | Copper precursors for CVD/ALD/digital CVD of copper metal films | Tianniu Chen, Chongying Xu, Thomas H. Baum, Bryan C. Hendrix, Juan E. Dominguez +2 more | 2011-06-21 |
| 7910765 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Ravi Laxman, Thomas H. Baum, Bryan C. Hendrix | 2011-03-22 |
| 7887883 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Chongying Xu, Thomas H. Baum, Bryan C. Hendrix | 2011-02-15 |
| 7862857 | Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material | Peter C. Van Buskirk, Steven M. Bilodeau, Michael W. Russell, Stephen T. Johnston, Daniel J. Vestyck +1 more | 2011-01-04 |
| 7858816 | Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films | Tianniu Chen, Chongying Xu, Thomas H. Baum | 2010-12-28 |
| 7838329 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Chongying Xu, Thomas H. Baum, Melissa A. Petruska +4 more | 2010-11-23 |
| 7786320 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Ravi Laxman, Thomas H. Baum, Bryan C. Hendrix | 2010-08-31 |
| 7781605 | Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films | Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Tianniu Chen, Thomas H. Baum | 2010-08-24 |
| 7750173 | Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films | Tianniu Chen, Chongying Xu, Thomas H. Baum | 2010-07-06 |
| 7713346 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Chongying Xu, Thomas H. Baum, Bryan C. Hendrix | 2010-05-11 |