KM

Koichi Motoyama

IBM: 26 patents #102 of 11,638Top 1%
Overall (2021): #1,085 of 548,734Top 1%
26
Patents 2021

Issued Patents 2021

Showing 25 most recent of 26 patents

Patent #TitleCo-InventorsDate
11205591 Top via interconnect with self-aligned barrier layer Kenneth Chun Kuen Cheng, Chanro Park, Chih-Chao Yang 2021-12-21
11201112 Fully-aligned skip-vias Kenneth Chun Kuen Cheng, Chanro Park, Chih-Chao Yang 2021-12-14
11201056 Pitch multiplication with high pattern fidelity Chanro Park, Kenneth Chun Kuen Cheng, Chih-Chao Yang 2021-12-14
11183455 Interconnects with enlarged contact area Oscar van der Straten, Kenneth Chun Kuen Cheng, Joseph F. Maniscalco 2021-11-23
11177169 Interconnects with gouged vias Kenneth Chun Kuen Cheng, Chih-Chao Yang, Hosadurga Shobha 2021-11-16
11177162 Trapezoidal interconnect at tight BEOL pitch Nicholas Anthony Lanzillo, Hosadurga Shobha, Huai Huang, Junli Wang, Christopher J. Penny +1 more 2021-11-16
11177163 Top via structure with enlarged contact area with upper metallization level Chanro Park, Kenneth Chun Kuen Cheng, Chih-Chao Yang 2021-11-16
11177214 Interconnects with hybrid metal conductors Kenneth Chun Kuen Cheng, Chanro Park, Chih-Chao Yang 2021-11-16
11177171 Encapsulated top via interconnects Oscar van der Straten, Kenneth Chun Kuen Cheng, Joseph F. Maniscalco 2021-11-16
11177170 Removal of barrier and liner layers from a bottom of a via Chanro Park, Kenneth Chun Kuen Cheng, Nicholas Anthony Lanzillo 2021-11-16
11164815 Bottom barrier free interconnects without voids Kenneth Chun Kuen Cheng, Kisik Choi, Cornelius Brown Peethala, Hosadurga Shobha, Joe Lee 2021-11-02
11164774 Interconnects with spacer structure for forming air-gaps Kenneth Chun Kuen Cheng, Chanro Park, Chih-Chao Yang 2021-11-02
11158538 Interconnect structures with cobalt-infused ruthenium liner and a cobalt cap Joseph F. Maniscalco, Oscar van der Straten, Scott A. DeVries, Alexander Reznicek 2021-10-26
11139201 Top via with hybrid metallization Nicholas Anthony Lanzillo, Christopher J. Penny, Somnath Ghosh, Robert R. Robison, Lawrence A. Clevenger 2021-10-05
11139202 Fully aligned top vias with replacement metal lines Chanro Park, Kenneth Chun Kuen Cheng, Chih-Chao Yang 2021-10-05
11127676 Removal or reduction of chamfer for fully-aligned via Chanro Park, Kenneth Chun Kuen Cheng, Chih-Chao Yang 2021-09-21
11101172 Dielectric damage-free dual damascene Cu interconnects without barrier at via bottom Benjamin D. Briggs, Gangadhara Raja Muthinti, Cornelius Brown Peethala, Lawrence A. Clevenger 2021-08-24
11094580 Structure and method to fabricate fully aligned via with reduced contact resistance Chanro Park, Kenneth Chun Kuen Cheng, Chih-Chao Yang 2021-08-17
11081388 Forming barrierless contact Kisik Choi, Ashim Dutta, Iqbal Rashid Saraf, Benjamin D. Briggs 2021-08-03
11069566 Hybrid sidewall barrier facilitating low resistance interconnection Oscar van der Straten, Joseph F. Maniscalco, Scott A. DeVries 2021-07-20
11062943 Top via interconnects with wrap around liner Nicholas Anthony Lanzillo, Christopher J. Penny, Somnath Ghosh, Robert R. Robison, Lawrence A. Clevenger 2021-07-13
11024577 Embedded anti-fuses for small scale applications Chanro Park, Kenneth Chun Kuen Cheng, Chih-Chao Yang 2021-06-01
10957646 Hybrid BEOL metallization utilizing selective reflection mask Benjamin D. Briggs, Cornelius Brown Peethala, Michael Rizzolo, Gen Tsutsui, Ruqiang Bao +2 more 2021-03-23
10950493 Interconnects having air gap spacers Kenneth Chun Kuen Cheng, Oscar van der Straten, Joseph F. Maniscalco, Chih-Chao Yang 2021-03-16
10903116 Void-free metallic interconnect structures with self-formed diffusion barrier layers Joseph F. Maniscalco, James J. Kelly, Hosadurga Shobha, Chih-Chao Yang 2021-01-26