KC

Kangguo Cheng

IBM: 304 patents #1 of 11,274Top 1%
TE Tessera: 10 patents #1 of 99Top 2%
ET Elpis Technologies: 9 patents #1 of 95Top 2%
Globalfoundries: 8 patents #22 of 583Top 4%
Samsung: 1 patents #7,050 of 16,666Top 45%
📍 Schenectady, NY: #1 of 134 inventorsTop 1%
🗺 New York: #1 of 13,306 inventorsTop 1%
Overall (2020): #1 of 565,922Top 1%
332
Patents 2020

Issued Patents 2020

Showing 251–275 of 332 patents

Patent #TitleCo-InventorsDate
10586858 Fabrication of vertical field effect transistor structure with strained channels Juntao Li 2020-03-10
10586843 Tunable on-chip nanosheet resistor Zhenxing Bi, Wei Wang, Zheng Xu 2020-03-10
10586800 Anti-fuse with reduced programming voltage Juntao Li, Chengwen Pei, Geng Wang 2020-03-10
10586799 Multiple-bit electrical fuses Ramachandra Divakaruni 2020-03-10
10586741 Gate height and spacer uniformity Lawrence A. Clevenger, Balasubramanian S. Pranatharthi Haran, John H. Zhang 2020-03-10
10586739 Self-aligned punch through stopper liner for bulk FinFET Veeraraghavan S. Basker, Theodorus E. Standaert, Junli Wang 2020-03-10
10586737 Method and structure for forming vertical transistors with shared gates and separate gates Zhenxing Bi, Juntao Li, Peng Xu 2020-03-10
10580692 Integration of air spacer with self-aligned contact in transistor Chanro Park, Ruilong Xie, Julien Frougier 2020-03-03
10580880 Replacement metal gate structures Veeraraghavan S. Basker, Theodorus E. Standaert, Junli Wang 2020-03-03
10580855 High thermal budget compatible punch through stop integration using doped glass Sanjay C. Mehta, Xin Miao, Chun-Chen Yeh 2020-03-03
10580854 High thermal budget compatible punch through stop integration using doped glass Sanjay C. Mehta, Xin Miao, Chun-Chen Yeh 2020-03-03
10580770 Vertical transistors with different gate lengths Xin Miao, Chen Zhang, Juntao Li 2020-03-03
10580743 Prevention of reverse engineering of security chips Qing Cao, Zhengwen Li, Fei Liu 2020-03-03
10580709 Flipped vertical field-effect-transistor Xin Miao, Wenyu Xu, Chen Zhang 2020-03-03
10580704 Semiconductor devices with sidewall spacers of equal thickness Balasubramanian Pranatharthiharan, Soon-Cheon Seo 2020-03-03
10573561 Formation of stacked nanosheet semiconductor devices Juntao Li, Heng Wu, Peng Xu 2020-02-25
10573755 Nanosheet FET with box isolation on substrate Julien Frougier, Nicolas Loubet, Ruilong Xie 2020-02-25
10573745 Super long channel device within VFET architecture Marc A. Bergendahl, Gauri Karve, Fee Li Lie, Eric R. Miller, John R. Sporre +1 more 2020-02-25
10573726 Replacement metal gate structures Veeraraghavan S. Basker, Theodorus E. Standaert, Junli Wang 2020-02-25
10573724 Contact over active gate employing a stacked spacer 2020-02-25
10573566 Fabrication of fin field effect transistor complementary metal-oxide-semiconductor devices with uniform hybrid channels Zhenxing Bi, Peng Xu, Jie Yang 2020-02-25
10573482 Piezoelectric vacuum transistor Qing Cao, Zhengwen Li, Fei Liu 2020-02-25
10566240 Wimpy device by selective laser annealing Nicolas Loubet, Xin Miao, Alexander Reznicek 2020-02-18
10566445 Gate spacer and inner spacer formation for nanosheet transistors having relatively small space between gates Zhenxing Bi, Nicolas Loubet, Xin Miao, Wenyu Xu, Chen Zhang 2020-02-18
10566444 Vertical fin field effect transistor with a reduced gate-to-bottom source/drain parasitic capacitance Chen Zhang, Xin Miao, Wenyu Xu 2020-02-18