Issued Patents 2019
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10522371 | Systems and methods for improved semiconductor etching and component protection | Tien Fak Tan, Lok Kee Loh, Dmitry Lubomirsky, Soonwook Jung, Martin Yue Choy | 2019-12-31 |
| 10504754 | Systems and methods for improved semiconductor etching and component protection | Tien Fak Tan, Lok Kee Loh, Dmitry Lubomirsky, Soonwook Jung, Martin Yue Choy | 2019-12-10 |
| 10504700 | Plasma etching systems and methods with secondary plasma injection | Toan Q. Tran, Zilu Weng, Dmitry Lubomirsky | 2019-12-10 |
| 10504697 | Particle generation suppresor by DC bias modulation | Jonghoon Baek, Xinglong Chen, Dmitry Lubomirsky | 2019-12-10 |
| 10490418 | Systems and methods for internal surface conditioning assessment in plasma processing equipment | Yufei Zhu, Edwin C. Suarez, Nitin K. Ingle, Dmitry Lubomirsky, Jiayin Huang | 2019-11-26 |
| 10468285 | High temperature chuck for plasma processing systems | Toan Q. Tran, Sultan Malik, Dmitry Lubomirsky, Shambhu N. Roy, Satoru Kobayashi +2 more | 2019-11-05 |
| 10460915 | Rotatable substrate support having radio frequency applicator | Satoru Kobayashi, Kirby H. Floyd, Hiroji Hanawa, Dmitry Lubomirsky | 2019-10-29 |
| 10453655 | Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion | Satoru Kobayashi, Hideo Sugai, Kartik Ramaswamy, Dmitry Lubomirsky | 2019-10-22 |
| 10431429 | Systems and methods for radial and azimuthal control of plasma uniformity | Satoru Kobayashi, Hideo Sugai, Nikolai Kalnin, Toan Q. Tran, Dmitry Lubomirsky | 2019-10-01 |
| 10354843 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Jang-Gyoo Yang +4 more | 2019-07-16 |
| 10340124 | Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide | Satoru Kobayashi, Hideo Sugai, Toan Q. Tran, Dmitry Lubomirsky | 2019-07-02 |
| 10319649 | Optical emission spectroscopy (OES) for remote plasma monitoring | Tae Seung Cho, Junghoon Kim, Dmitry Lubomirsky, Shankar Venkataraman | 2019-06-11 |