Issued Patents 2017
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9823577 | Facet mirror for a projection exposure apparatus | Michael Patra | 2017-11-21 |
| 9810992 | Illumination system | — | 2017-11-07 |
| 9810890 | Collector | — | 2017-11-07 |
| 9804499 | Illumination system of a microlithographic projection exposure apparatus | — | 2017-10-31 |
| 9791784 | Assembly for a projection exposure apparatus for EUV projection lithography | Michael Patra, Stig Bieling, Johannes Wangler | 2017-10-17 |
| 9696631 | Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system | Bernhard Kneer, Toralf Gruner | 2017-07-04 |
| 9671548 | Optical waveguide for guiding illumination light | Christian Wald, Stefan Schaff, Daniel Runde | 2017-06-06 |
| 9665010 | Method for operating a microlithographic projection exposure apparatus | — | 2017-05-30 |
| 9651875 | Illumination system and lithographic apparatus | Heine Melle Mulder, Steven George Hansen, Johannes Catharinus Hubertus Mulkens | 2017-05-16 |
| 9645501 | Illumination optical unit for EUV projection lithography, and optical system comprising such an illumination optical unit | Michael Patra | 2017-05-09 |
| 9606441 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard +8 more | 2017-03-28 |
| 9599904 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Michael Patra, Michael Layh | 2017-03-21 |
| 9588431 | Illumination optics and projection exposure apparatus | Artur Hoegele | 2017-03-07 |
| 9581911 | Polarization-modulating optical element | Damian Fiolka | 2017-02-28 |
| 9581910 | Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus | Frank Schlesener, Ingo Saenger, Olaf Dittmann, Aksel Goehnermeier, Alexandra Pazidis +2 more | 2017-02-28 |
| 9575414 | Illumination system for a microlithographic projection exposure apparatus | Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul +4 more | 2017-02-21 |
| 9563129 | Monitor system for determining orientations of mirror elements and EUV lithography system | Johannes Wangler, Johannes Eisenmenger, Michael Patra | 2017-02-07 |
| 9535210 | Optical hollow waveguide assembly | Stefan Schmidt, Vladimir Davydenko | 2017-01-03 |