Issued Patents 2017
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9817220 | Catadioptric projection objective comprising deflection mirrors and projection exposure method | Thomas Schicketanz | 2017-11-14 |
| 9785054 | Mirror, more particularly for a microlithographic projection exposure apparatus | Kerstin Hild | 2017-10-10 |
| 9759550 | Projection exposure apparatus for microlithography comprising an optical distance measurement system | Alexander Wolf, Markus Schwab, Joachim Hartjes | 2017-09-12 |
| 9733395 | Microlithographic projection exposure apparatus | Vladimir Kamenov, Daniel Kraehmer, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel +3 more | 2017-08-15 |
| 9726870 | Catadioptric projection objective | Alexander Epple, Vladimir Kamenov, Thomas Schicketanz | 2017-08-08 |
| 9696631 | Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system | Bernhard Kneer, Markus Deguenther | 2017-07-04 |
| 9684251 | Microlithographic projection exposure apparatus and method of correcting optical wavefront deformations in such an apparatus | Joerg Holzmann, Robert Weiss | 2017-06-20 |
| 9671703 | Optical arrangement, EUV lithography apparatus and method for configuring an optical arrangement | Norman Baer, Ulrich Loering | 2017-06-06 |
| 9665006 | Projection exposure method and projection exposure apparatus for microlithography | Volker Graeschus | 2017-05-30 |
| 9581813 | Method for improving the imaging properties of a projection objective, and such a projection objective | Olaf Conradi, Heiko Feldmann, Gerald Richter, Sascha Bleidistel, Andreas Frommeyer +1 more | 2017-02-28 |